Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 8/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.47 |
| ▸ | TP53 | P04637 | 4/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | THRB | P10828 | 2/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | MGLL | Q99685 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7642504 | 0.92 | TSHR (0.63) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL28675392 | 0.91 | ALDH1A1 (0.49) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL272759 | 0.89 | ALDH1A1 (0.51) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL14244559 | 0.88 | ALDH1A1 (0.54) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL14244380 | 0.88 | ALDH1A1 (0.54) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL14244350 | 0.88 | ALDH1A1 (0.54) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL14244498 | 0.88 | ALDH1A1 (0.54) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL14244556 | 0.88 | ALDH1A1 (0.54) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL14244603 | 0.88 | ALDH1A1 (0.54) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Di(Hydroxyethyl)Ether SCHEMBL28908686 | 0.87 | TSHR (0.52) | TSHRALDH1A1TP53HIF1AHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240158677-A1 | ADHESIVE AND METHOD FOR REMOVING THE SAME | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2024-05-16 | — | — | US | claimed |
| CN-117925117-A | Adhesive and removing method thereof | 财团法人工业技术研究院 | 2024-04-26 | — | — | CN | claimed |
| CN-113861850-B | Packaging adhesive film composition, packaging adhesive film and solar cell module | 杭州福斯特应用材料股份有限公司 | 2023-07-14 | — | — | CN | claimed |
| CN-113861850-A | Packaging adhesive film composition, packaging adhesive film and solar cell module | 杭州福斯特应用材料股份有限公司 | 2021-12-31 | — | — | CN | claimed |
| CN-113817138-A | UV-cured fingerprint-resistant resin with high fluorine content and preparation method and application thereof | 湖南昕逸辰科技有限公司 | 2021-12-21 | — | — | CN | claimed |
| US-20240158677-A1 | ADHESIVE AND METHOD FOR REMOVING THE SAME | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2024-05-16 | — | — | US | disclosed |
| CN-117925117-A | Adhesive and removing method thereof | 财团法人工业技术研究院 | 2024-04-26 | — | — | CN | disclosed |
| US-20230352733-A1 | ELECTROLYTE COMPOSITION, QUASI-SOLID ELECTROLYTE AND LITHIUM-ION BATTERY EMPLOYING THE SAME | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2023-11-02 | — | — | US | disclosed |
| EP-4270579-A2 | ELECTROLYTE COMPOSITION, QUASI-SOLID ELECTROLYTE AND LITHIUM-ION BATTERY EMPLOYING THE SAME | Industrial Technology Research Institute (TW) | 2023-11-01 | — | — | EP | disclosed |
| CN-116960450-A | Electrolyte composition, solid-like electrolyte and lithium ion battery comprising same | 财团法人工业技术研究院 | 2023-10-27 | — | — | CN | disclosed |
| CN-113861850-B | Packaging adhesive film composition, packaging adhesive film and solar cell module | 杭州福斯特应用材料股份有限公司 | 2023-07-14 | — | — | CN | disclosed |
| CN-107709493-B | Photocurable adhesive sheet, and image display device | 三菱化学株式会社 | 2022-08-09 | — | — | CN | disclosed |
| EP-1564232-B1 | PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR THE FORMATION OF HYDROGEL | TOYO GOSEI CO LTD (JP) | 2008-08-20 | — | — | EP | disclosed |
| US-7408002-B2 | Photosensitive resin composition and process for the formation of hydrogel | TOYO GOSEI CO., LTD (JP) | 2008-08-05 | — | — | US | disclosed |
| US-7320854-B2 | Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent | JSR CORPORATION (JP) | 2008-01-22 | — | — | US | disclosed |
| US-20060041052-A1 | Photosensitive resin compostion and process for the formation of hydrogel | TOYO GOSEI CO., LTD (JP) | 2006-02-23 | — | — | US | disclosed |
| EP-1564232-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR THE FORMATION OF HYDROGEL | Toyo Gosei Co., Ltd. (JP) | 2005-08-17 | — | — | EP | disclosed |
| EP-1494072-A2 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR Corporation (JP) | 2005-01-05 | — | — | EP | disclosed |
| US-20040265737-A1 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| US-4490433-A | IMPREGNATION WITH ACRYLATE COMPOUNDS AND CURING | TEIJIN LIMITED (JP) | 1984-12-25 | — | — | US | disclosed |