⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18145550 | 0.82 | — | — | |
| SCHEMBL19470208 | 0.82 | TSHR (0.37) | — | |
| SCHEMBL28882185 | 0.79 | — | — | |
| SCHEMBL536603 | 0.77 | — | — | |
| SCHEMBL9229770 | 0.73 | — | — | |
| SCHEMBL29013729 | 0.73 | TSHR (0.36) | — | |
| SCHEMBL17521970 | 0.73 | — | — | |
| SCHEMBL8152219 | 0.72 | TSHR (0.37) | — | |
| SCHEMBL28938003 | 0.71 | — | — | |
| SCHEMBL28937991 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20060079099-A1 | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-04-13 | — | — | US | claimed |
| EP-4519328-B1 | PROCESS FOR MELT FUNCTIONALIZATION OF SILICON HYDRIDE CONTAINING POLYOLEFIN AND PRODUCT | DOW GLOBAL TECHNOLOGIES LLC (US) | 2026-03-04 | — | — | EP | disclosed |
| US-20250346689-A1 | PROCESS FOR MELT FUNCTIONALIZATION OF SILICON HYDRIDE CONTAINING POLYOLEFIN AND PRODUCT | DOW GLOBAL TECHNOLOGIES LLC (US) | 2025-11-13 | — | — | US | disclosed |
| US-20250340680-A1 | CO-AGENT ASSISTED FORMATION OF CROSSLINKED SILICON-POLYOLEFIN INTERPOLYMER UTILIZING CROSSLINK AGENT | DOW GLOBAL TECHNOLOGIES LLC (US) | 2025-11-06 | — | — | US | disclosed |
| CN-116478320-B | Ethylene and alkenyl silicon-containing monomer copolymer and preparation method thereof | 华东理工大学 | 2025-04-08 | — | — | CN | disclosed |
| EP-4519345-A1 | CO-AGENT ASSISTED FORMATION OF CROSSLINKED SILICON-POLYOLEFIN INTERPOLYMER UTILIZING CROSSLINK AGENT | Dow Global Technologies LLC (US) | 2025-03-12 | — | — | EP | disclosed |
| EP-4519276-A1 | MOISTURE CURABLE SILICON POLYOLEFIN POLYMER AND PROCESS | Dow Global Technologies LLC (US) | 2025-03-12 | — | — | EP | disclosed |
| EP-4519328-A1 | PROCESS FOR MELT FUNCTIONALIZATION OF SILICON HYDRIDE CONTAINING POLYOLEFIN AND PRODUCT | Dow Global Technologies LLC (US) | 2025-03-12 | — | — | EP | disclosed |
| CN-119255999-A | Moisture curable silicone polyolefin polymers and methods | 陶氏环球技术有限责任公司 | 2025-01-03 | — | — | CN | disclosed |
| CN-119110813-A | Melt functionalization process and product of silicon hydride containing polyolefin | 陶氏环球技术有限责任公司 | 2024-12-10 | — | — | CN | disclosed |
| US-8268411-B2 | Materials containing voids with void size controlled on the nanometer scale | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-18 | — | — | US | disclosed |
| CN-102498133-A | Bid-or multi-head chain shuttling agents and their use for the preparation of block copolymers | DOW GLOBAL TECHNOLOGIES INC | 2012-06-13 | — | — | CN | disclosed |
| US-8097932-B2 | Ultra low κ plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-01-17 | — | — | US | disclosed |
| US-7674521-B2 | Materials containing voids with void size controlled on the nanometer scale | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-03-09 | — | — | US | disclosed |
| US-20090297729-A1 | MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMETER SCALE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-12-03 | — | — | US | disclosed |
| US-20090146265-A1 | ULTRA LOW k PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION PROCESSES USING A SINGLE BIFUNCTIONAL PRECURSOR CONTAINING BOTH A SiCOH MATRIX FUNCTIONALITY AND ORGANIC POROGEN FUNCTIONALITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-11 | — | — | US | disclosed |
| US-7491658-B2 | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-02-17 | — | — | US | disclosed |
| US-20070196639-A1 | Materials containing voids with void size controlled on the nanometer scale | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-08-23 | — | — | US | disclosed |
| US-20060079099-A1 | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-04-13 | — | — | US | disclosed |
| US-4425364-A | COSMETICS, SILANE OR SILOXANE COMPOUNDS | SOCIETE ANONYME DITE: L'OREAL (FR) | 1984-01-10 | — | — | US | disclosed |