Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CSNK2A1 | P68400 | 2/20 | 0.39 |
| ▸ | GRIN1 | Q05586 | 8/20 | 0.38 |
| ▸ | GRIN2B | Q13224 | 8/20 | 0.38 |
| ▸ | SLC18A3 | Q16572 | 1/20 | 0.37 |
| ▸ | AGER | Q15109 | 1/20 | 0.36 |
| ▸ | PER2 | O15055 | 4/20 | 0.33 |
| ▸ | CRY2 | Q49AN0 | 2/20 | 0.33 |
| ▸ | RGS4 | P49798 | 1/20 | 0.31 |
| ▸ | RGS8 | P57771 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24495845 | 0.93 | CSNK2A1 (0.36) | CSNK2A1GRIN1GRIN2BSLC18A3AGER | |
| SCHEMBL18503887 | 0.91 | GRIN1 (0.44) | CSNK2A1GRIN1GRIN2BSLC18A3AGER | |
| SCHEMBL24710431 | 0.89 | SLC18A3 (0.36) | CSNK2A1GRIN1GRIN2BSLC18A3AGER | |
| SCHEMBL24495798 | 0.89 | GRIN1 (0.37) | CSNK2A1GRIN1GRIN2BAGER | |
| SCHEMBL24495824 | 0.87 | GRIN1 (0.44) | CSNK2A1GRIN1GRIN2BSLC18A3AGER | |
| SCHEMBL12774670 | 0.84 | CYP3A4 (0.57) | GRIN1GRIN2B | |
| SCHEMBL15492844 | 0.84 | CSNK2A1 (0.35) | CSNK2A1GRIN1GRIN2BSLC18A3 | |
| SCHEMBL24495800 | 0.84 | GRIN1 (0.33) | CSNK2A1GRIN1GRIN2BSLC18A3 | |
| SCHEMBL24495893 | 0.84 | CYP3A4 (0.57) | GRIN1GRIN2B | |
| SCHEMBL11810902 | 0.82 | AGER (0.58) | GRIN1GRIN2BSLC18A3AGERPER2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-6316165-A | — | — | None | — | — | JP | disclosed |
| US-20240219834-A1 | METHOD FOR FORMING A RESIST PATTERN | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240059838-A1 | ALKOXYLATED POLYMERIC N-(HYDROXYALKYL)AMINE AS WETTING AGENTS AND AS A COMPONENT OF DEFOAMER COMPOSITIONS | BASF SE (DE) | 2024-02-22 | — | — | US | disclosed |
| EP-4263673-A1 | ALKOXYLATED POLYMERIC N-(HYDROXYALKYL)AMINE AS WETTING AGENTS AND AS A COMPONENT OF DEFOAMER COMPOSITIONS | BASF SE (DE) | 2023-10-25 | — | — | EP | disclosed |
| US-20230213857-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING RADICAL TRAPPING AGENT | NISSAN CHEMICAL CORPORATION (JP) | 2023-07-06 | — | — | US | disclosed |
| CN-116113657-A | Alkoxylated polymeric N- (hydroxyalkyl) amines as wetting agents and as components of defoamer compositions | 巴斯夫欧洲公司 | 2023-05-12 | — | — | CN | disclosed |
| CN-112654507-B | Lithographic printing plate precursor and waste plate precursor | 富士胶片株式会社 | 2023-05-02 | — | — | CN | disclosed |
| CN-112533764-B | Lithographic printing plate precursor, laminate thereof, method for making lithographic printing plate, and lithographic printing method | 富士胶片株式会社 | 2023-05-02 | — | — | CN | disclosed |
| CN-109952536-B | Radiation-sensitive composition, lithographic printing plate precursor, and method for making lithographic printing plate | 富士胶片株式会社 | 2022-07-08 | — | — | CN | disclosed |
| WO-2022129368-A1 | ALKOXYLATED POLYMERIC N-(HYDROXYALKYL)AMINE AS WETTING AGENTS AND AS A COMPONENT OF DEFOAMER COMPOSITIONS | BASF SE (DE) | 2022-06-23 | — | — | WO | disclosed |
| US-7425403-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-09-16 | — | — | US | disclosed |
| US-7332266-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-02-19 | — | — | US | disclosed |
| US-20080027160-A1 | Weatherability of flame retardant polyolefin | ZINGG JURG | 2008-01-31 | — | — | US | disclosed |
| US-20070064195-A1 | Stabilization of photochromic systems | CIBA CORPORATION | 2007-03-22 | — | — | US | disclosed |
| US-7169835-B2 | Stabilizer mixture | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2007-01-30 | — | — | US | disclosed |
| US-20060216652-A1 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-28 | — | — | US | disclosed |
| US-20040110096-A1 | Composition for forming antireflection film for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-06-10 | — | — | US | disclosed |
| EP-1378796-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2004-01-07 | — | — | EP | disclosed |
| JP-H06316165-A | SYNTHETIC WAX | MITSUI TOATSU CHEM INC | 1994-11-15 | — | — | JP | disclosed |
| US-4514526-A | Storage-stable tris(hydroxyalkyl)isocyanurate polyol dispersions, process for their preparation and their utilization | BASF AKTIENGESELLSCHAFT (DE) | 1985-04-30 | — | — | US | disclosed |