Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | ESR1 | P03372 | 1/20 | 0.31 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL433139 | 0.76 | ESR1 (0.42) | MAPTESR1ESR2 | |
| SCHEMBL5377950 | 0.76 | ESR1 (0.33) | MAPTESR1ESR2 | |
| SCHEMBL2369735 | 0.76 | ESR1 (0.33) | MAPTESR1ESR2 | |
| SCHEMBL1538674 | 0.74 | ESR1 (0.34) | MAPTESR1ESR2 | |
| SCHEMBL1538833 | 0.74 | ESR1 (0.34) | MAPTESR1ESR2 | |
| SCHEMBL8018745 | 0.73 | ESR1 (0.37) | ESR1ESR2 | |
| SCHEMBL11889758 | 0.72 | ESR1 (0.33) | MAPTESR1ESR2KMT2A | |
| SCHEMBL810787 | 0.72 | ESR1 (0.39) | MAPTESR1ESR2 | |
| SCHEMBL13621383 | 0.72 | ESR1 (0.39) | MAPTESR1ESR2 | |
| SCHEMBL13621386 | 0.72 | ESR1 (0.39) | MAPTESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20060079099-A1 | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-04-13 | — | — | US | claimed |
| US-20140050860-A1 | MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMETER SCALE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-02-20 | — | — | US | disclosed |
| US-8618183-B2 | Materials containing voids with void size controlled on the nanometer scale | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-12-31 | — | — | US | disclosed |
| US-20120328796-A1 | MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMETER SCALE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-12-27 | — | — | US | disclosed |
| US-8268411-B2 | Materials containing voids with void size controlled on the nanometer scale | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-18 | — | — | US | disclosed |
| US-8097932-B2 | Ultra low κ plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-01-17 | — | — | US | disclosed |
| US-7674521-B2 | Materials containing voids with void size controlled on the nanometer scale | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-03-09 | — | — | US | disclosed |
| US-20090297729-A1 | MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMETER SCALE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-12-03 | — | — | US | disclosed |
| US-20090146265-A1 | ULTRA LOW k PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION PROCESSES USING A SINGLE BIFUNCTIONAL PRECURSOR CONTAINING BOTH A SiCOH MATRIX FUNCTIONALITY AND ORGANIC POROGEN FUNCTIONALITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-11 | — | — | US | disclosed |
| US-7491658-B2 | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-02-17 | — | — | US | disclosed |
| US-20070196639-A1 | Materials containing voids with void size controlled on the nanometer scale | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-08-23 | — | — | US | disclosed |
| CN-1941359-A | Porous composite material and method for making same | IBM (US) | 2007-04-04 | — | — | CN | disclosed |
| US-20060079099-A1 | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-04-13 | — | — | US | disclosed |