SCHEMBL8018745

SCHEMBL8018745

C[Si](Cl)(Cl)O[Si](C)(c1ccccc1)c1ccccc1

nearest known ligand 0.37

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.37
ESR2 Q92731 1/20 0.37
NR1H2 P55055 1/20 0.31
NR1H3 Q13133 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL433139 0.85 ESR1 (0.42) ESR1ESR2NR1H2NR1H3
SCHEMBL13853169 0.84 ESR1 (0.35) ESR1ESR2
SCHEMBL5154791 0.81 ESR1 (0.41) ESR1ESR2NR1H2NR1H3
SCHEMBL810787 0.80 ESR1 (0.39) ESR1ESR2NR1H2NR1H3
SCHEMBL13621383 0.80 ESR1 (0.39) ESR1ESR2NR1H2NR1H3
SCHEMBL339537 0.80 ESR1 (0.39) ESR1ESR2NR1H2NR1H3
SCHEMBL13621386 0.80 ESR1 (0.39) ESR1ESR2NR1H2NR1H3
SCHEMBL9577405 0.78 ESR1 (0.38) ESR1ESR2NR1H2NR1H3
SCHEMBL19603995 0.78 ESR1 (0.38) ESR1ESR2NR1H2NR1H3
SCHEMBL9175132 0.78 ESR1 (0.38) ESR1ESR2NR1H2NR1H3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1092554-A Form the method for Micropicture SAMSUNG ELECTRONICS CO LTD (KR) 1994-09-21 CN claimed
EP-0600747-A2 Method for forming a fine pattern SAMSUNG ELECTRONICS CO., LTD. (KR) 1994-06-08 EP claimed
EP-0586860-A2 Photoresist composition and process for forming a pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 1994-03-16 EP claimed
CN-1083938-A Photoresist composition and application said composition produce the method for figure SAMSUNG ELECTRONICS CO LTD (KR) 1994-03-16 CN claimed
EP-0886807-B1 COLOR FILTER POLAROID CORP (US) 2000-01-12 EP disclosed
EP-0824719-A1 A PROCESS FOR OBTAINING A LIFT-OFF IMAGING PROFILE CLARIANT INTERNATIONAL LTD. (CH) 1998-02-25 EP disclosed
WO-1997033199-A1 A PROCESS FOR OBTAINING A LIFT-OFF IMAGING PROFILE CLARIANT INTERNATIONAL, LTD. (CH) 1997-09-12 WO disclosed
CN-1092554-A Form the method for Micropicture SAMSUNG ELECTRONICS CO LTD (KR) 1994-09-21 CN disclosed
EP-0600747-A2 Method for forming a fine pattern SAMSUNG ELECTRONICS CO., LTD. (KR) 1994-06-08 EP disclosed
EP-0586860-A2 Photoresist composition and process for forming a pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 1994-03-16 EP disclosed
CN-1083938-A Photoresist composition and application said composition produce the method for figure SAMSUNG ELECTRONICS CO LTD (KR) 1994-03-16 CN disclosed