Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Ammonia Solution, Strong. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL16150854 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL10427093 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL8553362 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL7168814 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL3277987 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL22639056 | 0.87 | — | — | |
| Ammonia Solution, Strong SCHEMBL19283422 | 0.87 | — | — | |
| Hydrochloric Acid SCHEMBL29276 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL334736 | 0.82 | — | — | |
| Ammonia Solution, Strong SCHEMBL30334162 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024149323-A1 | METHOD AND DEVICE FOR ELECTROLYSIS-ASSISTED OXIDATIVE REGENERATION OF ALKALINE COPPER CHLORIDE AMMONIA ETCHING WORKING SOLUTION | 叶涛 | 2024-07-18 | — | — | WO | claimed |
| WO-2023208060-A1 | METHOD FOR RECYCLING CIRCUIT BOARD COPPER CHLORIDE ETCHING WASTE LIQUID BY MEANS OF PRECIPITATION TREATMENT, AND APPARATUS THEREOF | 叶涛 | 2023-11-02 | — | — | WO | claimed |
| CN-115326229-A | Cold chain-oriented temperature response display agent applied to TTI (transmission time interval) | 东八(北京)材料科技有限公司 | 2022-11-11 | — | — | CN | claimed |
| CN-101706385-B | Cold acid corrosion method used for displaying low-multiple branch crystals in billet | LU TIAN | 2012-11-21 | — | — | CN | claimed |
| US-7862733-B2 | Method for manufacturing a probe | KABUSHIKI KAISHA NIHON MICRONICS (JP) | 2011-01-04 | — | — | US | claimed |
| CN-101706385-A | Cold acid corrosion method used for displaying low-multiple branch crystals in billet | LU TIAN | 2010-05-12 | — | — | CN | claimed |
| CN-100443635-C | Etching method of copper-coated electronic circuit board | SIYI DING (CN) | 2008-12-17 | — | — | CN | claimed |
| US-20080210663-A1 | METHOD FOR MANUFACTURING A PROBE | KABUSHIKI KAISHA NIHON MICRONICS (JP) | 2008-09-04 | — | — | US | claimed |
| CN-1280202-A | Process of extracting organic phase to wash away chlorine radical and counter extracting organic phase to wash away salphate radical with cuprammonium solution | YE FUXIANG (CN) | 2001-01-17 | — | — | CN | claimed |
| JP-4285182-A | — | — | None | — | — | JP | disclosed |
| CN-222989891-U | Processing apparatus of safe province material treatment ammonia nitrogen-containing waste liquid | 叶涛 | 2025-06-17 | — | — | CN | disclosed |
| WO-2024149323-A1 | METHOD AND DEVICE FOR ELECTROLYSIS-ASSISTED OXIDATIVE REGENERATION OF ALKALINE COPPER CHLORIDE AMMONIA ETCHING WORKING SOLUTION | 叶涛 | 2024-07-18 | — | — | WO | disclosed |
| WO-2024114054-A1 | AMMONIA ALKALINE TETRAAMMINECOPPER (II) SULFATE ETCHING PROCESS FOR CIRCUIT BOARD AND DEVICE THEREFOR | 叶涛 | 2024-06-06 | — | — | WO | disclosed |
| CN-117983824-A | Method for preparing copper nano powder by utilizing copper-containing etching waste liquid and landfill leachate | 常熟理工学院 | 2024-05-07 | — | — | CN | disclosed |
| US-5182187-A | Photoresists having good resistance to alkaline etching | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-01-26 | — | — | US | disclosed |
| JP-H04285182-A | IMPROVED METHOD FOR REGENERATING AMMONIACAL CHLORIDE ETCHING AGENT | MACDERMID INC | 1992-10-09 | — | — | JP | disclosed |
| CN-1006707-B | Mixture capable of radiation polymerization and method for preparing copolymer | HOECHST AG (DE) | 1990-02-07 | — | — | CN | disclosed |
| CN-85106270-A | The method that can carry out the mixture of radio polymerization and prepare multipolymer | — | 1987-02-18 | — | — | CN | disclosed |
| US-4619885-A | PHOTORESISTS | HOECHST AKTIENGESELLSCHAFT (DE) | 1986-10-28 | — | — | US | disclosed |
| US-4069076-A | APPLYING A PHOTORESIST FILM TO A RELIEF SUBSTRATE BY FLOODING WITH A SWELLING AGENT | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1978-01-17 | — | — | US | disclosed |