⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7553235 | 0.77 | TRPA1 (0.33) | — | |
| SCHEMBL660786 | 0.77 | — | — | |
| SCHEMBL4655872 | 0.77 | — | — | |
| SCHEMBL2780467 | 0.77 | TRPA1 (0.33) | — | |
| SCHEMBL28491588 | 0.74 | — | — | |
| SCHEMBL11580277 | 0.74 | — | — | |
| SCHEMBL9013097 | 0.72 | — | — | |
| SCHEMBL19696693 | 0.72 | — | — | |
| SCHEMBL546439 | 0.72 | — | — | |
| SCHEMBL3234240 | 0.72 | TRPA1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118226707-A | Photosensitive resin composition, cured film pattern, and method for producing same | 奇美实业股份有限公司 | 2024-06-21 | — | — | CN | disclosed |
| CN-118210200-A | Photosensitive resin composition, cured film pattern, and method for producing same | 奇美实业股份有限公司 | 2024-06-18 | — | — | CN | disclosed |
| CN-118210196-A | Photosensitive resin composition, cured film pattern and method for producing the same | 奇美实业股份有限公司 | 2024-06-18 | — | — | CN | disclosed |
| CN-118210199-A | Photosensitive resin composition, cured film pattern, and method for producing same | 奇美实业股份有限公司 | 2024-06-18 | — | — | CN | disclosed |
| CN-117289549-A | Photosensitive resin composition, cured film pattern, and method for producing same | 奇美实业股份有限公司 | 2023-12-26 | — | — | CN | disclosed |
| EP-2143739-A1 | URETHANE COMPOUND, CURABLE COMPOSITION CONTAINING THE SAME, AND CURED PRODUCT OF THE COMPOSITION | Showa Denko K.K. (JP) | 2010-01-13 | — | — | EP | disclosed |