Acrylic Acid

Acrylic Acid

SCHEMBL335935

C=CC(=O)O.O=C1CCCCCC(=O)O1

nearest known ligand 0.43

Full drug profile on Sugi Atlas →

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.43
TSHR P16473 1/20 0.42
CA1 P00915 1/20 0.34
CA9 Q16790 1/20 0.34
ALDH1A1 P00352 1/20 0.31
TRIM24 O15164 1/20 0.31
TRIM33 Q9UPN9 1/20 0.31
ALOX15 P16050 1/20 0.30
HSD17B10 Q99714 1/20 0.30
INMT O95050 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL10715123 0.93 LMNA (0.46) LMNATSHRCA1CA9ALOX15
Acrylic Acid SCHEMBL28100446 0.89 TSHR (0.55) LMNATSHRALOX15HSD17B10
Acrylic Acid SCHEMBL16612666 0.84 TSHR (0.50) LMNATSHRALDH1A1ALOX15HSD17B10
Acrylic Acid SCHEMBL9250354 0.82 CA1 (0.61) LMNATSHRCA1CA9ALDH1A1
Acrylic Acid SCHEMBL28693697 0.82 CA1 (0.61) LMNATSHRCA1CA9ALDH1A1
Acrylic Acid SCHEMBL30598695 0.82 CA1 (0.61) LMNATSHRCA1CA9ALDH1A1
Acrylic Acid SCHEMBL111449 0.82 CA1 (0.61) LMNATSHRCA1CA9ALDH1A1
Acrylic Acid SCHEMBL28278110 0.81 TSHR (0.46) LMNATSHRALOX15HSD17B10
Cyclohexanone SCHEMBL11800756 0.79 TRIM24 (0.55) LMNAALDH1A1TRIM24TRIM33ALOX15
Acrylic Acid SCHEMBL28186463 0.79 CA1 (0.57) LMNATSHRCA1CA9ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-9250098-A None JP disclosed
CN-115023449-A Release agent and method for producing resin molded article 哈利玛化成株式会社 2022-09-06 CN disclosed
EP-2316876-B1 ORGANIC POLYMER POROUS MATERIAL AND METHOD FOR PRODUCING THE SAME DAINIPPON INK & CHEMICALS (JP) 2016-11-16 EP disclosed
US-20120121858-A1 HYDROPHOBIC FILM, PATTERNED FILM HAVING HYDROPHOBIC AND HYDROPHILIC REGIONS, AND METHOD FOR PRODUCING THE SAME Kawamura Institue of Chemical Research (JP) 2012-05-17 US disclosed
US-8097657-B2 Organic polymer porous material and method for producing the same DIC CORPORATION (JP) 2012-01-17 US disclosed
US-20110207842-A1 ORGANIC POLYMER POROUS MATERIAL AND METHOD FOR PRODUCING THE SAME DIC CORPORATION (JP) 2011-08-25 US disclosed
EP-2316876-A1 ORGANIC POLYMER POROUS MATERIAL AND METHOD FOR PRODUCING THE SAME Kawamura Institute Of Chemical Research (JP) 2011-05-04 EP disclosed
US-7357864-B2 Microfluidic device KAWAMURA INSTITUTE OF CHEMICAL RESEARCH (JP) 2008-04-15 US disclosed
US-7220334-B2 Method of manufacturing microdevice having laminated structure KAWAMURA INSTITUTE OF CHEMICAL RESEARCH (JP) 2007-05-22 US disclosed
US-20060091051-A1 Micro fluid device and process for producing the same KAWAMURA INSTITUTE OF CHEMICAL RESEARCH (JP) 2006-05-04 US disclosed
US-20030175162-A1 Microdevice having multilayer structure and method for fabricating the same KAWAMURA INSTITUTE OF CHEMICAL RESEARCH (JP) 2003-09-18 US disclosed
EP-1295846-A1 MICRODEVICE HAVING MULTILAYER STRUCTURE AND METHOD FOR FABRICATING THE SAME KAWAMURA INSTITUTE OF CHEMICAL RESEARCH (JP) 2003-03-26 EP disclosed
JP-H09250098-A INTENSELY LUSTERED SHEET FOR PRINTING USE OJI PAPER CO LTD 1997-09-22 JP disclosed