⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13621333 | 0.84 | — | — | |
| SCHEMBL13621350 | 0.81 | — | — | |
| SCHEMBL3481575 | 0.78 | — | — | |
| SCHEMBL13621335 | 0.78 | — | — | |
| SCHEMBL3481321 | 0.78 | — | — | |
| SCHEMBL13621297 | 0.78 | — | — | |
| SCHEMBL217872 | 0.75 | — | — | |
| SCHEMBL13621351 | 0.75 | — | — | |
| SCHEMBL13621362 | 0.75 | — | — | |
| SCHEMBL16603031 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 642 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260131356-A1 | POLYMER FILM USING CHEMICAL VAPOR DEPOSITION USING SULFUR AS INITIATOR (SCVD), METHOD OF PREPARING THE SAME AND APPARATUS FOR PREPARING THE SAME | KOREA ADVANCED INST OF SCIENCE AND TECHNOLOGY (KR) | 2026-05-14 | — | — | US | claimed |
| EP-4735933-A2 | SURFACE ACTIVATED CHEMICAL VAPOR DEPOSITION AND USES THEREOF | Gvd Corporation (US) | 2026-05-06 | — | — | EP | claimed |
| EP-4721171-A1 | SOLID ELECTROLYTE CROSSLINKED WITH A VINYL SILOXANE CROSSLINKING AGENT | IFP Energies nouvelles (FR) | 2026-04-08 | — | — | EP | claimed |
| US-12521756-B2 | Protective coating | HZO, INC. | 2026-01-13 | — | — | US | claimed |
| EP-4450549-B1 | ENCAPSULANT FILM COMPOSITION AND ENCAPSULANT FILM COMPRISING SAME | LG CHEMICAL LTD (KR) | 2025-12-10 | — | — | EP | claimed |
| US-20250372685-A1 | METHOD FOR PREPARING AN ION EXCHANGE MEMBRANE | UNIV GRAZ TECH (AT) | 2025-12-04 | — | — | US | claimed |
| WO-2025106343-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-05-22 | — | — | WO | claimed |
| US-20250157825-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-05-15 | — | — | US | claimed |
| CN-117844445-B | Organic silicon liquid adhesive for LED and preparation method thereof | 江苏诚睿达光电有限公司 | 2025-05-09 | — | — | CN | claimed |
| EP-4543970-A1 | METHOD FOR PREPARING AN ION EXCHANGE MEMBRANE | Ecolyte GmbH (AT) | 2025-04-30 | — | — | EP | claimed |
| WO-2003005429-A1 | METHOD FOR PREPARING LOW DIELECTRIC FILMS | POSTECH FOUNDATION (KR) | 2003-01-16 | — | — | WO | claimed |
| US-6432137-B1 | EYE PROSTHETIC INSERTS | MEDENNIUM, INC. | 2002-08-13 | — | — | US | claimed |
| US-20020074086-A1 | Adhesive composition and optical device using the same | NIPPON SHEET GLASS CO., LTD. (JP) | 2002-06-20 | — | — | US | claimed |
| EP-1210133-A1 | HIGH REFRACTIVE INDEX SILICONE FOR USE IN INTRAOCULAR LENSES | Medennium, Inc. (US) | 2002-06-05 | — | — | EP | claimed |
| WO-2001017570-A1 | HIGH REFRACTIVE INDEX SILICONE FOR USE IN INTRAOCULAR LENSES | MEDENNIUM, INC. (US) | 2001-03-15 | — | — | WO | claimed |
| US-6136874-A | Microporous polymeric foams made with silicon or germanium based monomers | THE PROCTER & GAMBLE COMPANY (US) | 2000-10-24 | — | — | US | claimed |
| EP-0768860-A2 | DENTAL IMPRESSION MATERIAL WITH CURE-INDICATING DYE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1997-04-23 | — | — | EP | claimed |
| US-5596025-A | POLYSILOXANE CURABLE BY HYDROSILATION REACTION, COLOR CHANGE ON CURING | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1997-01-21 | — | — | US | claimed |
| WO-1996000560-A2 | DENTAL IMPRESSION MATERIAL WITH CURE-INDICATING DYE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-01-11 | — | — | WO | claimed |
| US-5214074-A | Unsaturated compound for controlling curing reaction such that it takes place at the same rate as decomposition of foaming agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1993-05-25 | — | — | US | claimed |