⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3658977 | 0.74 | — | — | |
| SCHEMBL3010609 | 0.65 | — | — | |
| Butadiene SCHEMBL3312310 | 0.65 | — | — | |
| SCHEMBL1893231 | 0.65 | — | — | |
| SCHEMBL120969 | 0.61 | — | — | |
| SCHEMBL5848293 | 0.61 | — | — | |
| Butadiene SCHEMBL3313078 | 0.61 | — | — | |
| SCHEMBL17064191 | 0.61 | — | — | |
| SCHEMBL117360 | 0.58 | — | — | |
| SCHEMBL18887603 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070083015-A1 | Modified poly(ethynylene phenylene ethynylene silylene) polymers, compositions containing them, processing for preparing them and cured products | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 2007-04-12 | — | — | US | claimed |
| EP-1682607-A2 | MODIFIED POLY(ETHYNYLENE PHENYLENE ETHYNYLENE SILYLENE) POLYMERS, COMPOSITIONS CONTAINING SAME, PREPARATION METHODS THEREOF AND CURED PRODUCTS | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 2006-07-26 | — | — | EP | claimed |
| US-20060079099-A1 | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-04-13 | — | — | US | claimed |
| WO-2005049733-A2 | MODIFIED POLY(ETHYNYLENE PHENYLENE ETHYNYLENE SILYLENE) POLYMERS, COMPOSITIONS CONTAINING SAME, PREPARATION METHODS THEREOF AND CURED PRODUCTS | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 2005-06-02 | — | — | WO | claimed |
| US-20140050860-A1 | MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMETER SCALE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-02-20 | — | — | US | disclosed |
| US-8618183-B2 | Materials containing voids with void size controlled on the nanometer scale | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-12-31 | — | — | US | disclosed |
| US-20120328796-A1 | MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMETER SCALE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-12-27 | — | — | US | disclosed |
| US-8268411-B2 | Materials containing voids with void size controlled on the nanometer scale | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-18 | — | — | US | disclosed |
| US-8097932-B2 | Ultra low κ plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-01-17 | — | — | US | disclosed |
| US-7674521-B2 | Materials containing voids with void size controlled on the nanometer scale | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-03-09 | — | — | US | disclosed |
| US-20090297729-A1 | MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMETER SCALE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-12-03 | — | — | US | disclosed |
| US-20090146265-A1 | ULTRA LOW k PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION PROCESSES USING A SINGLE BIFUNCTIONAL PRECURSOR CONTAINING BOTH A SiCOH MATRIX FUNCTIONALITY AND ORGANIC POROGEN FUNCTIONALITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-11 | — | — | US | disclosed |
| US-20070196639-A1 | Materials containing voids with void size controlled on the nanometer scale | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-08-23 | — | — | US | disclosed |
| US-20070083015-A1 | Modified poly(ethynylene phenylene ethynylene silylene) polymers, compositions containing them, processing for preparing them and cured products | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 2007-04-12 | — | — | US | disclosed |
| EP-1682607-A2 | MODIFIED POLY(ETHYNYLENE PHENYLENE ETHYNYLENE SILYLENE) POLYMERS, COMPOSITIONS CONTAINING SAME, PREPARATION METHODS THEREOF AND CURED PRODUCTS | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 2006-07-26 | — | — | EP | disclosed |
| US-20060079099-A1 | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-04-13 | — | — | US | disclosed |
| WO-2005049733-A2 | MODIFIED POLY(ETHYNYLENE PHENYLENE ETHYNYLENE SILYLENE) POLYMERS, COMPOSITIONS CONTAINING SAME, PREPARATION METHODS THEREOF AND CURED PRODUCTS | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 2005-06-02 | — | — | WO | disclosed |
| US-20050065285-A1 | Compositions with poly(ethynylene phenylene ethynylene silylenes) | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 2005-03-24 | — | — | US | disclosed |
| EP-1483332-A2 | COMPOSITIONS WITH POLY(ETHYNYLENE PHENYLENE ETHYNYLENE SILYLENES) | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 2004-12-08 | — | — | EP | disclosed |
| WO-2003076516-A2 | COMPOSITIONS WITH POLY(ETHYNYLENE PHENYLENE ETHYNYLENE SILYLENES) | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 2003-09-18 | — | — | WO | disclosed |