SCHEMBL336281

SCHEMBL336281

CC(C)(N=NC(C)(C)C(N)=NO)C(N)=NO

nearest known ligand 0.46

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.46
CYP3A4 P08684 1/20 0.46
MAPT P10636 1/20 0.46
CYP2D6 P10635 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL6054785 0.97 ALDH1A1 (0.50) ALDH1A1CYP3A4MAPTCYP2D6
SCHEMBL11858454 0.92 ALDH1A1 (0.40) ALDH1A1CYP3A4MAPTCYP2D6
SCHEMBL10456754 0.87 ALDH1A1 (0.37) ALDH1A1CYP3A4MAPTCYP2D6
SCHEMBL8525811 0.85 ALDH1A1 (0.36) ALDH1A1CYP3A4MAPTCYP2D6
Citric Acid SCHEMBL8528242 0.74 ALDH1A1 (0.52) ALDH1A1CYP3A4MAPTCYP2D6
SCHEMBL515078 0.73
SCHEMBL283408 0.73
SCHEMBL283407 0.73
SCHEMBL11628648 0.72
SCHEMBL642780 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 284 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9293344-B2 Cmp polishing slurry and method of polishing substrate HITACHI CHEMICAL COMPANY, LTD. (JP) 2016-03-22 US claimed
US-8900335-B2 CMP polishing slurry and method of polishing substrate HITACHI CHEMICAL COMPANY, LTD. (JP) 2014-12-02 US claimed
EP-2165828-B1 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same FUJIFILM CORP (JP) 2011-11-09 EP claimed
US-20030181616-A1 Halogenated monomers and polymers and process for making same THOMAS BRIAN (US) 2003-09-25 US claimed
WO-2003068718-A2 HALOGENATED MONOMERS AND POLYMERS AND PROCESS FOR MAKING SAME PHOTON-X, INC. (US) 2003-08-21 WO claimed
EP-0679665-B1 Polymerization of acrylic acid and derivatives thereof WAKO PURE CHEM IND LTD (JP) 1998-12-30 EP claimed
US-5563276-A Polymerization of acrylic acid and derivatives thereof using azoamidoxime salt WACO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1996-10-08 US claimed
EP-0679665-A1 Polymerization of acrylic acid and derivatives thereof WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1995-11-02 EP claimed
JP-8113605-A None JP disclosed
JP-10265600-A None JP disclosed
JP-60104107-A None JP disclosed
EP-4372063-A1 TAPE LAMINATE, MICROFLUIDIC CHIP AND MICROFLUIDIC DEVICE SEKISUI CHEMICAL CO., LTD. (JP) 2024-05-22 EP disclosed
WO-2023190037-A1 SILICONE SKELETON-CONTAINING COMPOUND 味の素株式会社 2023-10-05 WO disclosed
US-20230311126-A1 MICROFLUIDIC CHIP, CELL ANALYSIS DEVICE, CELL ANALYSIS SYSTEM, AND CELL ANALYSIS METHOD SEKISUI CHEMICAL CO., LTD. (JP) 2023-10-05 US disclosed
EP-0196587-A2 Method for improving color fastness NITTO BOSEKI CO., LTD. (JP) 1986-10-08 EP disclosed
EP-0173963-A2 Polymers of n-substituted secondary monoallylamines and their salts and process for producing the same NITTO BOSEKI CO., LTD. (JP) 1986-03-12 EP disclosed
US-4528347-A Process for producing polymers of monoallylamine 501 Nitto Boseki, Co. Ltd (JP) 1985-07-09 US disclosed
EP-0145220-A2 Process for producing polymers of monoallylamine NITTO BOSEKI CO., LTD. (JP) 1985-06-19 EP disclosed
EP-0145220-A2 Process for producing polymers of monoallylamine NITTO BOSEKI CO., LTD. (JP) 1985-06-19 EP disclosed
JP-S60104107-A PRODUCTION OF MONOALLYLAMINE POLYMER NITTO BOSEKI CO LTD 1985-06-08 JP disclosed