Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL3363274

C=CC(C)(O)C(O)(O)O.N.N

nearest known ligand 0.32

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Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28598425 0.82 ALOX15 (0.36) ALOX15
SCHEMBL8724486 0.76
Ammonia Solution, Strong SCHEMBL766637 0.74
Ammonia Solution, Strong SCHEMBL11504576 0.74
SCHEMBL8665784 0.71
SCHEMBL129187 0.70
SCHEMBL1548339 0.70
SCHEMBL6028003 0.67
SCHEMBL28497774 0.67
Tert-Butanol SCHEMBL15510638 0.67 ALOX15 (0.36) ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100096274-A1 ZINC ALLOY ELECTROPLATING BATHS AND PROCESSES MACDERMID, INCORPORATED 2010-04-22 US claimed
US-10025181-B2 Polymer composition and photoresist comprising same DOW GLOBAL TECHNOLOGIES LLC (US) 2018-07-17 US disclosed
EP-2540750-A1 Polymer composition and photoresist comprising same Dow Global Technologies LLC (US) 2013-01-02 EP disclosed
US-20120328983-A1 POLYMER COMPOSITION AND PHOTORESIST COMPRISING SAME DOW GLOBAL TECHNOLOGIES LLC (US) 2012-12-27 US disclosed