Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.41 |
| ▸ | NAAA | Q02083 | 1/20 | 0.38 |
| ▸ | DGKA | P23743 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | ESR1 | P03372 | 1/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.33 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.33 |
| ▸ | KDR | P35968 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | PPM1B | O75688 | 1/20 | 0.33 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.33 |
| ▸ | PPP1CC | P36873 | 1/20 | 0.33 |
| ▸ | RAD52 | P43351 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3364135 | 0.88 | ATM (0.50) | HCAR2NAAADGKAALDH1A1ATM | |
| SCHEMBL5434716 | 0.86 | NAAA (0.57) | HCAR2NAAADGKAALDH1A1ATM | |
| SCHEMBL5447357 | 0.84 | NAAA (0.60) | HCAR2NAAADGKALMNATSHR | |
| SCHEMBL5429611 | 0.84 | NAAA (0.60) | HCAR2NAAADGKALMNATSHR | |
| SCHEMBL5433721 | 0.84 | NAAA (0.60) | HCAR2NAAADGKALMNATSHR | |
| SCHEMBL5434669 | 0.84 | NAAA (0.60) | HCAR2NAAADGKALMNATSHR | |
| SCHEMBL5443453 | 0.84 | NAAA (0.60) | HCAR2NAAADGKALMNATSHR | |
| SCHEMBL5447314 | 0.84 | NAAA (0.60) | HCAR2NAAADGKALMNATSHR | |
| SCHEMBL5437844 | 0.84 | NAAA (0.60) | HCAR2NAAADGKALMNATSHR | |
| SCHEMBL1100419 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0443059-B1 | 3-(Substituted phenyl)pyrazole derivatives, salts thereof, herbicides therefrom, and process for producing said derivatives or salts | NIHON NOHYAKU CO LTD (JP) | 1998-06-17 | — | — | EP | claimed |
| EP-0361114-B1 | 3-(Substituted phenyl) pyrazole derivatives, salts thereof, herbicides therefrom, and process for producing said derivatives or salts | NIHON NOHYAKU CO LTD (JP) | 1998-06-03 | — | — | EP | claimed |
| US-11886119-B2 | Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| CN-110709774-B | Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2023-12-08 | — | — | CN | disclosed |
| US-20230185195-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11599025-B2 | Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2023-03-07 | — | — | US | disclosed |
| CN-115702138-A | Enol ether pro-fragrances | 弗门尼舍有限公司 | 2023-02-14 | — | — | CN | disclosed |
| US-20200264511-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-08-20 | — | — | US | disclosed |
| EP-3693793-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT | Mitsui Chemicals, Inc. (JP) | 2020-08-12 | — | — | EP | disclosed |
| US-20200241419-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-07-30 | — | — | US | disclosed |
| CN-111183395-A | Resin material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2020-05-19 | — | — | CN | disclosed |
| US-5948593-A | CONTAINING A PIPYRROMETHENE METAL CHELATE COMPOUND | MITSUI CHEMICALS, INC. (JP) | 1999-09-07 | — | — | US | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0443059-B1 | 3-(Substituted phenyl)pyrazole derivatives, salts thereof, herbicides therefrom, and process for producing said derivatives or salts | NIHON NOHYAKU CO LTD (JP) | 1998-06-17 | — | — | EP | disclosed |
| EP-0361114-B1 | 3-(Substituted phenyl) pyrazole derivatives, salts thereof, herbicides therefrom, and process for producing said derivatives or salts | NIHON NOHYAKU CO LTD (JP) | 1998-06-03 | — | — | EP | disclosed |
| EP-0822544-A1 | Optical recording medium | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1998-02-04 | — | — | EP | disclosed |
| US-5620944-A | PRE- AND POST-EMERGENT WEED CONTROL | NIHON NOHYAKU CO., LTD. (JP) | 1997-04-15 | — | — | US | disclosed |
| EP-0590834-B1 | Phenylimidazole derivatives, processes for production thereof, herbicides comprising said derivatives, and usages of said herbicides | NIHON NOHYAKU CO LTD (JP) | 1996-12-11 | — | — | EP | disclosed |
| EP-0590834-A1 | Phenylimidazole derivatives, processes for production thereof, herbicides comprising said derivatives, and usages of said herbicides | NIHON NOHYAKU CO., LTD. (JP) | 1994-04-06 | — | — | EP | disclosed |
| US-4214093-A | PROTEOLYTIC ENZYME INHIBITORS | TORII & CO., LTD. (JP) | 1980-07-22 | — | — | US | disclosed |