SCHEMBL3368035

SCHEMBL3368035

Cl[C]1CCCC(Cl)(Cl)C1(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL575056 0.71
SCHEMBL1163522 0.70
SCHEMBL10585028 0.70
SCHEMBL7123365 0.63
SCHEMBL542129 0.60
SCHEMBL6418913 0.60
SCHEMBL5448313 0.60
Perchlorobenzene SCHEMBL9436478 0.59
SCHEMBL3206477 0.59
SCHEMBL11684353 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7833691-B2 Heterocycle-bearing onium salts WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-11-16 US disclosed
EP-1953149-B1 A heterocycle-containing onium salt WAKO PURE CHEM IND LTD (JP) 2010-10-06 EP disclosed
EP-1449833-B1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION WAKO PURE CHEM IND LTD (JP) 2009-09-09 EP disclosed
EP-1481973-B1 HETEROCYCLE-BEARING ONIUM SALTS WAKO PURE CHEM IND LTD (JP) 2008-12-31 EP disclosed
EP-1953149-A2 A heterocycle-containing onium salt Wako Pure Chemical Industries, Ltd. (JP) 2008-08-06 EP disclosed
US-20080161520-A1 Heterocycle-bearing onium salts WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2008-07-03 US disclosed
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
US-7318991-B2 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2008-01-15 US disclosed
US-20050233253-A1 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) 2005-10-20 US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 US disclosed
US-5180418-A HERBICIDALLY ACTIVE THIADIAZABICYCLONONANES AND NONENES CIBA-GEIGY CORPORATION (US) 1993-01-19 US disclosed
WO-1992021684-A1 NEW HERBICIDES CIBA-GEIGY AG (CH) 1992-12-10 WO disclosed
EP-0468924-A2 New herbicides CIBA-GEIGY AG (CH) 1992-01-29 EP disclosed
EP-0391847-A1 1-Phenyl-piperidine-2,4-dione with herbicidal activity CIBA-GEIGY AG (CH) 1990-10-10 EP disclosed
US-4929272-A N-phenyl-maleimides and N-phenyl-succinimides and their use in a herbicidal and/or plant growth regulating action CIBA-GEIGY CORPORATION (US) 1990-05-29 US disclosed
US-4919704-A PREEMERGENCE AND POSTEMERGENCE HERBICIDES CIBA-GEIGY CORPORATION (US) 1990-04-24 US disclosed
EP-0305333-A2 Herbicides CIBA-GEIGY AG (CH) 1989-03-01 EP disclosed
EP-0303573-A1 Pyrrolidine-2,5 diones and 4,5,6,7-tetrahydroiso-indole-1,3 diones CIBA-GEIGY AG (CH) 1989-02-15 EP disclosed
US-4804400-A PRE- AND POSTEMERGENCE; GRAINS CIBA-GEIGY CORPORATION (US) 1989-02-14 US disclosed
EP-0260228-A2 N-phenyl-malein imides and N-phenyl-succinimides with a herbicidal and a plant growth regulation activity CIBA-GEIGY AG (CH) 1988-03-16 EP disclosed