Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 7/20 | 0.71 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.71 |
| ▸ | CA1 | P00915 | 4/20 | 0.48 |
| ▸ | SLC1A2 | P43004 | 3/20 | 0.47 |
| ▸ | SLC1A1 | P43005 | 3/20 | 0.47 |
| ▸ | SLC1A3 | P43003 | 2/20 | 0.47 |
| ▸ | GRIK1 | P39086 | 2/20 | 0.42 |
| ▸ | GRIK2 | Q13002 | 2/20 | 0.42 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.42 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.42 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.42 |
| ▸ | HTR2A | P28223 | 1/20 | 0.42 |
| ▸ | HTR2C | P28335 | 1/20 | 0.42 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.42 |
| ▸ | HRH1 | P35367 | 1/20 | 0.42 |
| ▸ | DRD3 | P35462 | 1/20 | 0.42 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.42 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.42 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 2-Ethylhexanoic Acid SCHEMBL5875169 | 0.89 | CA2 (0.77) | CA2MAPK1CA1SLC1A2SLC1A1 | |
| 2-Ethylhexanoic Acid SCHEMBL5874518 | 0.89 | CA2 (0.77) | CA2MAPK1CA1SLC1A2SLC1A1 | |
| 2-Ethylhexanoic Acid SCHEMBL28640149 | 0.88 | CA2 (0.69) | CA2MAPK1CA1SLC1A2SLC1A1 | |
| 2-Ethylhexanoic Acid SCHEMBL9578250 | 0.88 | CA2 (0.69) | CA2MAPK1CA1SLC1A2SLC1A1 | |
| 2-Ethylhexanoic Acid SCHEMBL229027 | 0.87 | CA2 (0.87) | CA2MAPK1CA1SLC1A2SLC1A1 | |
| 2-Ethylhexanoic Acid SCHEMBL1833763 | 0.87 | CA2 (0.87) | CA2MAPK1CA1SLC1A2SLC1A1 | |
| 2-Ethylhexanoic Acid SCHEMBL6401977 | 0.87 | CA2 (0.87) | CA2MAPK1CA1SLC1A2SLC1A1 | |
| 2-Ethylhexanoic Acid SCHEMBL714133 | 0.87 | CA2 (0.87) | CA2MAPK1CA1SLC1A2SLC1A1 | |
| 2-Ethylhexanoic Acid SCHEMBL5046747 | 0.87 | CA2 (0.87) | CA2MAPK1CA1SLC1A2SLC1A1 | |
| 2-Ethylhexanoic Acid SCHEMBL30096054 | 0.87 | CA2 (0.95) | CA2MAPK1CA1SLC1A2SLC1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109789064-B | Methods, compositions and uses related thereto | 因诺斯佩克有限公司 | 2023-11-21 | — | — | CN | disclosed |
| CN-109789319-B | Reduction of color loss from dyed materials by using amine salts of carboxylic acids | 因诺斯佩克有限公司 | 2023-09-29 | — | — | CN | disclosed |
| CN-116286162-A | Lubricating rust-proof quick-drying agent and preparation method thereof | 山东新华莎罗雅生物技术有限公司 | 2023-06-23 | — | — | CN | disclosed |
| EP-1668170-B1 | COMPOSITION AND PROCESS FOR IMPROVING THE ADHESION OF A SICCATIVE ORGANIC COATING COMPOSITIONS TO METAL SUBSTRATES | ATOTECH DEUTSCHLAND GMBH (DE) | 2010-10-13 | — | — | EP | disclosed |
| US-7223299-B2 | Composition and process for improving the adhesion of a siccative organic coating compositions to metal substrates | ATOTECH DEUTSCHLAND GMBH (DE) | 2007-05-29 | — | — | US | disclosed |
| US-20060286393-A1 | Composition and process for improving the adhesion of a siccative organic coating compositions to metal substrates | KLOECKENER JAMES R | 2006-12-21 | — | — | US | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| EP-1668170-A1 | COMPOSITION AND PROCESS FOR IMPROVING THE ADHESION OF A SICCATIVE ORGANIC COATING COMPOSITIONS TO METAL SUBSTRATES | ATOTECH DEUTSCHLAND GMBH (DE) | 2006-06-14 | — | — | EP | disclosed |
| WO-2005021835-A1 | COMPOSITION AND PROCESS FOR IMPROVING THE ADHESION OF A SICCATIVE ORGANIC COATING COMPOSITIONS TO METAL SUBSTRATES | ATOTECH DEUTSCHLAND GMBH (DE) | 2005-03-10 | — | — | WO | disclosed |
| US-20050048211-A1 | Composition and process for improving the adhesion of a siccative organic coating compositions to metal substrates | ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH) (DE) | 2005-03-03 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |