SCHEMBL3378987

SCHEMBL3378987

CC(C)=C[SiH2]OCC(CO[SiH2]C=C(C)C)(CO[SiH2]C=C(C)C)CO[SiH2]C=C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL264827 0.74
SCHEMBL18824453 0.70
SCHEMBL3317969 0.68
SCHEMBL5701593 0.64
SCHEMBL4739880 0.63
SCHEMBL5338942 0.63
SCHEMBL4451580 0.62
SCHEMBL27884447 0.62
SCHEMBL15154813 0.61
SCHEMBL1765969 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020116367-A1 POLYBUTADIENE AND METHOD FOR PRODUCING SAME 宇部興産株式会社 2020-06-11 WO disclosed
EP-1452549-B1 PROCESS FOR PRODUCING MODIFIED POLYMER, APPARATUS FOR PRODUCING MODIFIED POLYMER, AND MODIFIED POLYMER SEKISUI CHEMICAL CO LTD (JP) 2010-11-17 EP disclosed
US-7629419-B2 Process for producing modified polymer, apparatus for producing modified polymer, and modified polymer SEKISUI CHEMICAL CO., LTD. (JP) 2009-12-08 US disclosed
US-20050053792-A1 High purity; using supercritical fluid; high temperature; high pressure; polyolefins; interface film for glass; ceramic binder SEKISUI CHEMICAL CO., LTD. (JP) 2005-03-10 US disclosed
EP-1452549-A1 PROCESS FOR PRODUCING MODIFIED POLYMER&amp;comma; APPARATUS FOR PRODUCING MODIFIED POLYMER&amp;comma; AND MODIFIED POLYMER SEKISUI CHEMICAL CO., LTD. (JP) 2004-09-01 EP disclosed
US-5622784-A WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM SEIKO EPSON CORPORATION (JP) 1997-04-22 US disclosed