SCHEMBL33802

SCHEMBL33802

C[SiH](C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25371109 0.82
SCHEMBL7761463 0.80
SCHEMBL133734 0.75
SCHEMBL133158 0.75
SCHEMBL41518 0.75
SCHEMBL9906392 0.75
SCHEMBL19926940 0.75
SCHEMBL628852 0.74
SCHEMBL13210314 0.72
SCHEMBL120202 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3353 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2026106029-A1 LOW MOISTURE ABSORPTION COATED SEPARATOR AND METHOD FOR MANUFACTURING SAME 더블유스코프코리아 주식회사 2026-05-21 WO claimed
EP-4698584-A1 METHOD FOR PREPARING SILANOL-FUNCTIONAL ORGANOSILICON COMPOUNDS DOW GLOBAL TECHNOLOGIES LLC (US) 2026-02-25 EP claimed
EP-4628423-A1 CONTAINER FOR STORING ADDITION-CURING LIQUID SILICONE COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-10-08 EP claimed
US-12398241-B2 Composition and method for reacting an organosilicon compound and a silyl hydride catalyzed by a fluorinated arylborane Lewis acid DOW GLOBAL TECHNOLOGIES LLC (US) 2025-08-26 US claimed
US-12350646-B1 CO2 gas-soluble silicon nanofluid and preparation method therefor SOUTHWEST PETROLEUM UNIVERSITY (CN) 2025-07-08 US claimed
CN-120192613-A Wear-resistant and crack-resistant polypropylene material and preparation method thereof 揭阳市双展塑胶有限公司 2025-06-24 CN claimed
CN-120158142-A Plant-based water-based ink and preparation method thereof 肇庆斯塔文化用品有限公司 2025-06-17 CN claimed
WO-2025106343-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2025-05-22 WO claimed
US-20250157825-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2025-05-15 US claimed
CN-119751875-A Regular structure polyorganosiloxane and preparation method thereof 湖南大学 2025-04-04 CN claimed
US-4954597-A ALLYL ESTER, METAL CATALYST DOW CORNING CORPORATION (US) 1990-09-04 US claimed
US-4954364-A RELEASE AGENTS GENERAL ELECTRIC COMPANY (US) 1990-09-04 US claimed
US-4954401-A Process of curing methylhydrosiloxanes DOW CORNING CORPORATION (US) 1990-09-04 US claimed
US-4912242-A Process for preparing silicon esters DOW CORNING CORPORATION (US) 1990-03-27 US claimed
EP-0323715-A2 Hair styling agents and compositions containing the same THE PROCTER & GAMBLE COMPANY (US) 1989-07-12 EP claimed
EP-0243006-A2 Block-graft copolymers and process for producing the same Shin-Etsu Chemical Co., Ltd. (JP) 1987-10-28 EP claimed
EP-0082079-B1 PROCESS FOR ETCHING AND DEACTIVATING GLASS CAPILLARIES FOR CHROMATOGRAPHY THE DOW CHEMICAL COMPANY (US) 1986-04-16 EP claimed
EP-0082079-A1 Process for etching and deactivating glass capillaries for chromatography THE DOW CHEMICAL COMPANY (US) 1983-06-22 EP claimed
US-4376641-A Coated capillary chromatographic column THE DOW CHEMICAL COMPANY (US) 1983-03-15 US claimed
US-4048356-A METAL ELECTRODES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1977-09-13 US claimed