⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6092292 | 0.74 | CYP2C19 (0.36) | — | |
| SCHEMBL2058181 | 0.73 | — | — | |
| SCHEMBL14128015 | 0.73 | — | — | |
| SCHEMBL9286272 | 0.71 | PARP1 (0.33) | — | |
| SCHEMBL9801430 | 0.70 | — | — | |
| Ammonia Solution, Strong SCHEMBL28025301 | 0.69 | PARP1 (0.33) | — | |
| SCHEMBL4079651 | 0.69 | TSHR (0.31) | — | |
| SCHEMBL22446868 | 0.69 | — | — | |
| SCHEMBL10560484 | 0.69 | — | — | |
| Ammonia Solution, Strong SCHEMBL18244314 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020116367-A1 | POLYBUTADIENE AND METHOD FOR PRODUCING SAME | 宇部興産株式会社 | 2020-06-11 | — | — | WO | disclosed |
| EP-1452549-B1 | PROCESS FOR PRODUCING MODIFIED POLYMER, APPARATUS FOR PRODUCING MODIFIED POLYMER, AND MODIFIED POLYMER | SEKISUI CHEMICAL CO LTD (JP) | 2010-11-17 | — | — | EP | disclosed |
| US-7629419-B2 | Process for producing modified polymer, apparatus for producing modified polymer, and modified polymer | SEKISUI CHEMICAL CO., LTD. (JP) | 2009-12-08 | — | — | US | disclosed |
| US-20050053792-A1 | High purity; using supercritical fluid; high temperature; high pressure; polyolefins; interface film for glass; ceramic binder | SEKISUI CHEMICAL CO., LTD. (JP) | 2005-03-10 | — | — | US | disclosed |
| EP-1452549-A1 | PROCESS FOR PRODUCING MODIFIED POLYMER&comma; APPARATUS FOR PRODUCING MODIFIED POLYMER&comma; AND MODIFIED POLYMER | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-09-01 | — | — | EP | disclosed |
| US-6506537-B2 | Photopolymerization | JSR CORPORATION (JP) | 2003-01-14 | — | — | US | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |