SCHEMBL3387048

SCHEMBL3387048

C=C(CCl)OC(=C)CCl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL610322 0.81 TSHR (0.35)
SCHEMBL610323 0.78
SCHEMBL9072582 0.78
SCHEMBL6374137 0.73
SCHEMBL29124 0.72 ALDH1A1 (0.32)
SCHEMBL12655279 0.72
SCHEMBL11804093 0.67 ALDH1A1 (0.33)
SCHEMBL10032968 0.67
SCHEMBL4729788 0.65 ALDH1A1 (0.32)
SCHEMBL2421580 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0908473-B1 Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process SHINETSU CHEMICAL CO (JP) 2006-02-01 EP claimed
US-3997507-A PERFLUOROALKYL ACRYLATE ASAHI GLASS CO., LTD. (JA) 1976-12-14 US claimed
EP-4563649-A1 ACRYLIC RUBBER COMPOSITION AND RUBBER CROSSLINKED PRODUCT Zeon Corporation (JP) 2025-06-04 EP disclosed
US-20240301107-A1 ACRYLIC RUBBER, RUBBER COMPOSITION AND RUBBER CROSSLINKED PRODUCT ZEON CORPORATION (JP) 2024-09-12 US disclosed
EP-4317223-A1 ACRYLIC RUBBER, RUBBER COMPOSITION AND RUBBER CROSSLINKED PRODUCT Zeon Corporation (JP) 2024-02-07 EP disclosed
EP-3533807-B1 METHOD FOR PRODUCING ACRYLIC RUBBER ZEON CORP (JP) 2023-03-15 EP disclosed
EP-3575345-B1 METHOD FOR PRODUCING ACRYLIC RUBBER ZEON CORP (JP) 2022-05-11 EP disclosed
US-20200239612-A1 ACRYLIC RUBBER ZEON CORPORATION (JP) 2020-07-30 US disclosed
US-10597346-B2 Methods for producing solvents derived from 1-chloro-3, 3, 3-trifluoro-propene (1233zd) HONEYWELL INTERNATIONAL INC. (US) 2020-03-24 US disclosed
US-20190292120-A1 METHODS FOR PRODUCING SOLVENTS DERIVED FROM 1-CHLORO-3, 3, 3-TRIFLUORO-PROPENE (1233ZD) SOLSTICE ADVANCED MATERIALS US, INC. 2019-09-26 US disclosed
EP-3533807-A1 METHOD FOR PRODUCING ACRYLIC RUBBER Zeon Corporation (JP) 2019-09-04 EP disclosed
EP-1801091-A2 Process for preparing fluorohalogenethers Solvay Solexis S.p.A. (IT) 2007-06-27 EP disclosed
EP-0908473-B1 Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process SHINETSU CHEMICAL CO (JP) 2006-02-01 EP disclosed
US-6613844-B2 Polyhydroxystyrene type polymer containing acid labile groups, endcapped and optionally crosslinked; improved alkali dissolution contrast, sensitivity, resolution, plasma etching resistance, heat resistance, and reproducibility SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-09-02 US disclosed
US-20030013832-A1 Novel styrene polymer, chemically amplified positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-01-16 US disclosed
US-6384169-B1 POLYHYDROXYSTYRENE WITH ACID LABILE GROUP, MODIFIED AT ENDS WITH ALKYLS, ESTERS OR ALCOHOLS; INCREASED DISSOLUTION RATE, HIGH SENSITIVITY AND RESOLUTION; RESIST PATTERNS HAVE PLASMA ETCHING RESISTANCE, HEAT RESISTANCE, REPRODUCIBILITY SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-05-07 US disclosed
EP-0908473-A1 Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-04-14 EP disclosed
US-4237258-A CONTAINING MINOR AMOUNTS OF ETHYLENICALLY UNSATURATED MONOMERS; MOLDING MATERIAL MONTEDISON S.P.A. (IT) 1980-12-02 US disclosed
US-4107384-A Method for producing porous fibers MITSUBISHI RAYON CO., LTD. (JP) 1978-08-15 US disclosed
US-3997507-A PERFLUOROALKYL ACRYLATE ASAHI GLASS CO., LTD. (JA) 1976-12-14 US disclosed