SCHEMBL339041

SCHEMBL339041

CC(CCc1ccccc1C(=O)O)CN(C)C

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FOLH1 Q04609 5/20 0.54
NPC1 O15118 1/20 0.42
MAPT P10636 1/20 0.42
MAPK1 P28482 1/20 0.42
HTT P42858 1/20 0.42
RAB9A P51151 1/20 0.42
ATM Q13315 1/20 0.42
KMT2A Q03164 2/20 0.41
TSHR P16473 1/20 0.40
SLC16A3 O15427 2/20 0.39
ALDH1A1 P00352 2/20 0.39
ABCC1 P33527 1/20 0.39
KDM4E B2RXH2 1/20 0.39
HSD17B10 Q99714 1/20 0.39
ALOX15 P16050 1/20 0.38
PTPN1 P18031 1/20 0.38
MASP2 O00187 1/20 0.38
GFER P55789 1/20 0.38
MEN1 O00255 1/20 0.38
LMNA P02545 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7460817 0.85 FOLH1 (0.47) FOLH1MAPTHTTKMT2ATSHR
SCHEMBL442094 0.84 FOLH1 (0.59) FOLH1MAPTKMT2ATSHRSLC16A3
SCHEMBL29647810 0.83 FOLH1 (0.54) FOLH1KMT2ATSHRSLC16A3ALDH1A1
SCHEMBL3381062 0.82 FOLH1 (0.50) FOLH1TSHRSLC16A3ALDH1A1KDM4E
SCHEMBL29236016 0.79 FOLH1 (0.51) FOLH1NPC1MAPTMAPK1HTT
SCHEMBL28396145 0.79 FOLH1 (0.58) FOLH1MAPTHTTKMT2ATSHR
SCHEMBL466771 0.79 FOLH1 (0.50) FOLH1MAPTKMT2ATSHRSLC16A3
SCHEMBL18301542 0.78 FOLH1 (0.56) FOLH1MAPTHTTKMT2ATSHR
SCHEMBL110298 0.77 FOLH1 (0.65) FOLH1TSHRSLC16A3ALDH1A1ABCC1
SCHEMBL27416812 0.77 TAAR1 (0.52) TSHRALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2325693-B1 Composition for forming a patterned film of surface-modified carbon nanotubes SAMSUNG ELECTRONICS CO LTD (KR) 2015-04-08 EP claimed
EP-1500978-B1 Photosensitive metal nanoparticle and method of forming conductive pattern using the same SAMSUNG ELECTRONICS CO LTD (KR) 2014-04-23 EP claimed
EP-1422563-B1 Method of forming a patterned film of surface-modified carbon nanotubes, surface-modified carbon nanotubes and a film comprising the same SAMSUNG ELECTRONICS CO LTD (KR) 2013-12-11 EP claimed
EP-2325693-A1 Composition for Forming a Patterned Film of Surface-Modified Carbon Nanotubes SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-05-25 EP claimed
US-7166412-B2 Photosensitive metal nanoparticle and method of forming conductive pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-01-23 US claimed
US-7008758-B2 Photomasks; photolithography; plasma enhanced chemical vapor deposition SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-03-07 US claimed
EP-1500978-A2 Photosensitive metal nanoparticle and method of forming conductive pattern using the same Samsung Electronics Co., Ltd. (KR) 2005-01-26 EP claimed
US-20040253536-A1 Photosensitive metal nanoparticle and method of forming conductive pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-12-16 US claimed
US-20040101634-A1 Method of forming a patterned film of surface-modified carbon nanotubes SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-05-27 US claimed
EP-1422563-A1 Method of forming a patterned film of surface-modified carbon nanotubes SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-05-26 EP claimed
WO-2023204314-A1 PIGMENT DISPERSION, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, BLACK MATRIX, AND IMAGE DISPLAY DEVICE 三菱ケミカル株式会社 2023-10-26 WO disclosed
WO-2023182350-A1 PIGMENT DISPERSION LIQUID, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, BLACK MATRIX, IMAGE DISPLAY DEVICE, AND METHOD FOR PRODUCING PIGMENT DISPERSION LIQUID 三菱ケミカル株式会社 2023-09-28 WO disclosed
WO-2023176899-A1 PHOTOSENSITIVE RESIN COMPOSITION, PIGMENT DISPERSION, CURED PRODUCT, BLACK MATRIX, AND IMAGE DISPLAY DEVICE 三菱ケミカル株式会社 2023-09-21 WO disclosed
WO-2023176898-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, BLACK MATRIX, AND IMAGE DISPLAY DEVICE 三菱ケミカル株式会社 2023-09-21 WO disclosed
WO-2023176888-A1 COLOR FILTER MANUFACTURING METHOD AND IMAGE DISPLAY DEVICE MANUFACTURING METHOD 三菱ケミカル株式会社 2023-09-21 WO disclosed
WO-1994019185-A1 LIQUID CURABLE RESIN COMPOSITION DSM N.V. (NL) 1994-09-01 WO disclosed
EP-0580108-A2 A photosensitive polyimide composition ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1994-01-26 EP disclosed
EP-0554404-A4 CURABLE LIQUID RESIN COMPOSITION 1993-10-27 EP disclosed
EP-0554404-A1 CURABLE LIQUID RESIN COMPOSITION DSM N.V. (NL) 1993-08-11 EP disclosed
WO-1992006846-A1 CURABLE LIQUID RESIN COMPOSITION DSM DESOTECH, INC. (US) 1992-04-30 WO disclosed