Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30409572 | 0.95 | — | — | |
| Bromide SCHEMBL3391850 | 0.90 | — | — | |
| Fluoride Ion SCHEMBL31683192 | 0.90 | — | — | |
| SCHEMBL7181523 | 0.90 | — | — | |
| Water SCHEMBL7125489 | 0.90 | — | — | |
| Hydrochloric Acid SCHEMBL965718 | 0.90 | — | — | |
| SCHEMBL1717736 | 0.79 | TSHR (0.35) | — | |
| SCHEMBL7183290 | 0.79 | TSHR (0.35) | — | |
| SCHEMBL7183389 | 0.79 | TSHR (0.35) | — | |
| SCHEMBL7175327 | 0.76 | TSHR (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102775345-A | Preparation method of roflumilast and intermediates | TOPHARMAN SHANGHAI CO LTD | 2012-11-14 | — | — | CN | claimed |
| EP-1670742-A1 | PROCESS FOR THE PREPARATION OF ROFLUMILAST | Ranbaxy Laboratories Limited (IN) | 2006-06-21 | — | — | EP | claimed |
| WO-2005026095-A1 | PROCESS FOR THE PREPARATION OF ROFLUMILAST | RANBAXY LABORATORIES LIMITED (IN) | 2005-03-24 | — | — | WO | claimed |
| US-20260071095-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2026-03-12 | — | — | US | disclosed |
| US-20250320381-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2025-10-16 | — | — | US | disclosed |
| US-20250282977-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2025-09-11 | — | — | US | disclosed |
| EP-2973631-A2 | METHODS OF ENHANCING ELECTROCHEMICAL DOUBLE LAYER CAPACITOR (EDLC) PERFORMANCE AND EDLC DEVICES FORMED THEREFROM | Esionic Corp. (US) | 2016-01-20 | — | — | EP | disclosed |
| CN-105189522-A | Low symmetry molecules and phosphonium salts, methods of making, and devices formed therefrom | ESIONIC ES INC | 2015-12-23 | — | — | CN | disclosed |
| EP-2945956-A1 | LOW SYMMETRY MOLECULES AND PHOSPHONIUM SALTS, METHODS OF MAKING AND DEVICES FORMED THERE FROM | Esionic Corp. (US) | 2015-11-25 | — | — | EP | disclosed |
| EP-2929588-A1 | ELECTROLYTE COMPOSITIONS, METHODS OF MAKING AND BATTERY DEVICES FORMED THERE FROM | Esionic Corp. (US) | 2015-10-14 | — | — | EP | disclosed |
| EP-2929553-A1 | ELECTROLYTE COMPOSITIONS AND ELECTROCHEMICAL DOUBLE LAYER CAPACITORS FORMED THERE FROM | Esionic Corp. (US) | 2015-10-14 | — | — | EP | disclosed |
| US-6160181-A | Tetraene derivative and process for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-12-12 | — | — | US | disclosed |
| EP-1047674-A1 | PROCESS FOR PRODUCTION OF DONEPEZIL DERIVATIVES | Eisai Co., Ltd. (JP) | 2000-11-02 | — | — | EP | disclosed |
| CN-1247864-A | Tetraene derivative and its production | SUMITOMO CHEMICAL CO (JP) | 2000-03-22 | — | — | CN | disclosed |
| EP-0983998-A1 | Tetraene derivative and process for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-03-08 | — | — | EP | disclosed |
| WO-1999036405-A1 | PROCESS FOR PRODUCTION OF DONEPEZIL DERIVATIVE | EISAI CO., LTD. (JP) | 1999-07-22 | — | — | WO | disclosed |
| EP-0900785-A2 | Vitamin A related compounds and process for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-03-10 | — | — | EP | disclosed |
| EP-0502707-B1 | Method for production of 3-cyano-3,5,5-trimethyl cyclohexanone | NIPPOH CHEMICALS (JP) | 1995-10-25 | — | — | EP | disclosed |
| US-5179221-A | METHOD FOR PRODUCTION OF 3-CYANO-3,5,5-TRIMETHYL CYCLOHEXANONE | NIPPON CHEMICALS CO., LTD. (JP) | 1993-01-12 | — | — | US | disclosed |
| EP-0502707-A1 | Method for production of 3-cyano-3,5,5-trimethyl cyclohexanone | NIPPOH CHEMICALS CO., LTD. (JP) | 1992-09-09 | — | — | EP | disclosed |