SCHEMBL3392076

SCHEMBL3392076

CCC(CCCSSCCCC(CC)S(=O)(=O)O)S(=O)(=O)O

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
FOLH1 Q04609 1/20 0.33
TP53 P04637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3392125 0.87 HDAC3 (0.31)
SCHEMBL19154601 0.80 TP53 (0.43) TP53
SCHEMBL16370551 0.80 TP53 (0.34) TP53
SCHEMBL5072539 0.78 TP53 (0.52) TP53
SCHEMBL15357336 0.77 LMNA (0.39) TP53
SCHEMBL11503783 0.77 TP53 (0.50) TP53
SCHEMBL13186373 0.77 TP53 (0.50) TP53
SCHEMBL5468722 0.77 TP53 (0.50) TP53
SCHEMBL17703947 0.77 TP53 (0.50) TP53
SCHEMBL9187707 0.77 TP53 (0.50) TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9562299-B2 Copper electroplating solution and copper electroplating apparatus SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-02-07 US disclosed
US-20120193238-A1 Compositions For Plating Copper And Methods Of Forming A Copper Bump Using The Same SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-08-02 US disclosed
US-20100084277-A1 Composition for copper plating and associated methods SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-04-08 US disclosed