SCHEMBL3394231

SCHEMBL3394231

CC(CCCSSCCCC(C)S(=O)(=O)O)S(=O)(=O)O

nearest known ligand 0.38

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.38
FOLH1 Q04609 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11895963 0.96 TP53 (0.35) TP53FOLH1
SCHEMBL3393114 0.93 TP53 (0.41) TP53FOLH1
SCHEMBL3390106 0.91 TP53 (0.39) TP53
SCHEMBL3391834 0.86 TP53 (0.35) TP53
SCHEMBL28800003 0.84 TP53 (0.34) TP53
SCHEMBL3393824 0.84 TP53 (0.34) TP53
SCHEMBL16370393 0.78 TP53 (0.41) TP53
SCHEMBL14955034 0.77 TP53 (0.42) TP53
SCHEMBL3392030 0.77
SCHEMBL17870840 0.76 TP53 (0.45) TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9562299-B2 Copper electroplating solution and copper electroplating apparatus SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-02-07 US disclosed
US-20120193238-A1 Compositions For Plating Copper And Methods Of Forming A Copper Bump Using The Same SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-08-02 US disclosed
US-20100084277-A1 Composition for copper plating and associated methods SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-04-08 US disclosed