SCHEMBL339550

SCHEMBL339550

CCCCCCCCCc1cccc(P)c1CCCCCCCCC

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
LIPG Q9Y5X9 1/20 0.50
BID P55957 3/20 0.46
MCL1 Q07820 3/20 0.46
BCL2L1 Q07817 2/20 0.46
BAK1 Q16611 2/20 0.46
KAT8 Q9H7Z6 2/20 0.46
PPARA Q07869 2/20 0.46
PPARG P37231 1/20 0.46
EP300 Q09472 1/20 0.46
KAT2A Q92830 1/20 0.46
KAT2B Q92831 1/20 0.46
KAT5 Q92993 1/20 0.46
SAE1 Q9UBE0 1/20 0.46
KCNH2 Q12809 2/20 0.46
ALOX5 P09917 1/20 0.45
PTGS2 P35354 1/20 0.45
TYR P14679 1/20 0.43
CYSLTR2 Q9NS75 5/20 0.43
CYSLTR1 Q9Y271 5/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6285351 1.00 LIPG (0.50) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL29210030 1.00 LIPG (0.50) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL9113466 1.00 LIPG (0.50) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL2922724 1.00 LIPG (0.50) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL6279009 1.00 LIPG (0.50) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL5729888 0.98 LIPG (0.47) LIPGBIDMCL1BCL2L1BAK1
Hydrochloric Acid SCHEMBL29193922 0.96 LIPG (0.46) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL301548 0.92 LIPG (0.40) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL11225510 0.91 BID (0.45) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL11228913 0.89 BID (0.42) LIPGBIDMCL1BCL2L1BAK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118027253-A Isobutenyl quaternary phosphonium salt ionic polymer, preparation method and application thereof, and antibacterial high polymer material 中国石油化工股份有限公司 2024-05-14 CN disclosed
US-20160313676-A1 SURFACE PROCESSOR AND METHOD FOR PROCESSING A SURFACE OF A PLASTIC RECORDING MEDIUM USING A TONER AFFINITY INGREDIENT YAMASHITA MASAHIDE (JP) 2016-10-27 US disclosed
US-9201334-B2 Residual voltage reducing processing cartridge, image forming apparatus with same, and image forming method RICOH COMPANY, LTD. (JP) 2015-12-01 US disclosed
CN-103109237-B Photoelectric conductor for electronic photography, formation method, imaging device and handle box RICOH CO.,LTD. (JP) 2015-09-02 CN disclosed
US-20150071662-A1 PROCESSING CARTRIDGE, IMAGE FORMING APPARATUS WITH SAME, AND IMAGE FORMING METHOD RICOH COMPANY, LTD. (JP) 2015-03-12 US disclosed
CN-102163013-B Electrophotographic photoreceptor and image forming apparatus using the same MITSUBISHI CHEM CORP 2015-02-18 CN disclosed
CN-102169298-B Image forming apparatus with a plurality of image forming units MITSUBISHI CHEM CORP 2014-01-08 CN disclosed
CN-101482707-B Electrophotographic photoreceptor, and image formihg appratus and process cartridge using same RICOH KK 2013-11-20 CN disclosed
CN-102004400-B Image bearing member-protecting agent, protecting agent-supplying device and image forming apparatus RICOH CO LTD 2013-11-06 CN disclosed
CN-102156394-B Electrophotographic photoreceptor, and image forming apparatus and electrophotographic photoreceptor cartridge using the same MITSUBISHI CHEM CORP 2013-09-25 CN disclosed
CN-1438549-A Developing method of image-formation device, and developing mechanism using said method RICOH KK (JP) 2003-08-27 CN disclosed
CN-1405640-A Electronic photographic photo-receptor, image-forming method and instrument, and film cartridge for treatment RICOH KK (JP) 2003-03-26 CN disclosed
EP-1199613-A2 Method for removing deposit from image substrate and image formation apparatus using the method Ricoh Company, Ltd. (JP) 2002-04-24 EP disclosed
CN-1067018-C Heat treatment method for resin laminated sheet IDEMITSU KOSAN CO (JP) 2001-06-13 CN disclosed
US-6090512-A PHOTORECEPTOR INCLUDING CONDUCTIVE SUBSTRATE AND PHOTOSENSITIVE LAYER CONTAINING ARYLAMINE COMPOUND MITSUBISHI CHEMICAL CORPORATION (JP) 2000-07-18 US disclosed
CN-1029604-C Resin laminated sheet and method for producing same IDEMISTU KOSAN K K (JP) 1995-08-30 CN disclosed
CN-1029603-C Resin laminated sheet and method for producing same IDEMITSU KOSAN CO (JP) 1995-08-30 CN disclosed
CN-1101603-A Heat treatment method for resin laminated sheet IDEMITSU KOSAN CO (JP) 1995-04-19 CN disclosed
CN-1058372-A Resin laminated sheet and method for producing same IDEMITSU KOSAN CO (JP) 1992-02-05 CN disclosed
CN-1037483-A Resin laminated sheet and method for producing same IDEMITSU KOSAN CO (JP) 1989-11-29 CN disclosed