⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28736199 | 1.00 | — | — | |
| SCHEMBL28443222 | 1.00 | — | — | |
| SCHEMBL28425591 | 1.00 | — | — | |
| SCHEMBL28401765 | 1.00 | — | — | |
| Methane SCHEMBL5573690 | 0.82 | — | — | |
| SCHEMBL5483199 | 0.82 | — | — | |
| SCHEMBL7715416 | 0.82 | — | — | |
| SCHEMBL16896236 | 0.82 | — | — | |
| SCHEMBL6759872 | 0.82 | — | — | |
| SCHEMBL7214914 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 818 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12517423-B2 | Extreme ultraviolet mask with alloy based absorbers | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-01-06 | — | — | US | claimed |
| CN-119403197-B | Nickel silicide forming method and semiconductor device | 晶芯成(北京)科技有限公司 | 2025-05-02 | — | — | CN | claimed |
| CN-119208348-B | Image sensor, preparation method thereof and electronic equipment | 合肥晶合集成电路股份有限公司 | 2025-03-28 | — | — | CN | claimed |
| CN-119430975-A | High-toughness ablation-resistant hafnium-tantalum-carbon solid solution ceramic matrix composite material and preparation method thereof | 西安电子科技大学 | 2025-02-14 | — | — | CN | claimed |
| CN-119403197-A | Nickel silicide forming method and semiconductor device | 晶芯成(北京)科技有限公司 | 2025-02-07 | — | — | CN | claimed |
| WO-2025000815-A1 | BIPOLAR PLATE OF PROTON EXCHANGE MEMBRANE ELECTROLYTIC CELL, AND PREPARATION METHOD THEREFOR | 阳光氢能科技有限公司 | 2025-01-02 | — | — | WO | claimed |
| US-12181797-B2 | Extreme ultraviolet mask with alloy based absorbers | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-12-31 | — | — | US | claimed |
| CN-119208348-A | Image sensor, preparation method thereof and electronic equipment | 合肥晶合集成电路股份有限公司 | 2024-12-27 | — | — | CN | claimed |
| US-12153337-B2 | Extreme ultraviolet mask with tantalum base alloy absorber | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-11-26 | — | — | US | claimed |
| US-12102019-B2 | Data storage structure for improving memory cell reliability | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-09-24 | — | — | US | claimed |
| WO-2012050964-A1 | SYSTEMS AND METHODS USING A GLASSY CARBON HEATER | THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK (US) | 2012-04-19 | — | — | WO | claimed |
| EP-2160998-B1 | Two-part implant with a hydroxylated soft tissue contact surface | STRAUMANN HOLDING AG (CH) | 2012-04-04 | — | — | EP | claimed |
| EP-2108617-B1 | Reagent dispensing apparatus | PRAXAIR TECHNOLOGY INC (US) | 2012-02-08 | — | — | EP | claimed |
| US-20120018722-A1 | ION-SENSITIVE SENSOR WITH MULTILAYER CONSTRUCTION IN THE SENSITIVE REGION | ENDRESS + HAUSER CONDUCTA GESELLSCHAFT FUR MESS- UND REGELTECHNIK MBH + CO. KG (DE) | 2012-01-26 | — | — | US | claimed |
| US-20110143139-A1 | NANOPLATELET METAL HYDROXIDES AND METHODS OF PREPARING SAME | AQUA RESOURCES CORPORATION (US) | 2011-06-16 | — | — | US | claimed |
| US-20110127450-A1 | Laser-Heated Infrared Source | ENERGETIQ TECHNOLOGY, INC. (US) | 2011-06-02 | — | — | US | claimed |
| CN-101684520-B | Ultrasonic-assisted densification device | BEIJING NONFERROUS METAL | 2011-05-18 | — | — | CN | claimed |
| CN-101684520-A | Ultrasonic-assisted densification device | BEIJING NONFERROUS METAL | 2010-03-31 | — | — | CN | claimed |
| US-7642550-B2 | Multi-layer structures for parameter measurement | MICRON TECHNOLOGY, INC. (US) | 2010-01-05 | — | — | US | claimed |
| CN-1248233-A | Method for making submicrometer transition metal carbonitrides | OMG AMERICAN CO (US) | 2000-03-22 | — | — | CN | claimed |