⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11573024 | 0.87 | — | — | |
| SCHEMBL28247166 | 0.87 | — | — | |
| SCHEMBL28815650 | 0.87 | — | — | |
| SCHEMBL28401765 | 0.82 | — | — | |
| SCHEMBL28443222 | 0.82 | — | — | |
| SCHEMBL28736199 | 0.82 | — | — | |
| SCHEMBL28425591 | 0.82 | — | — | |
| SCHEMBL2590811 | 0.82 | — | — | |
| SCHEMBL33977 | 0.82 | — | — | |
| SCHEMBL417334 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101809499-B | Mask blank, and method for production of imprint mold | HOYA CORP | 2012-10-10 | — | — | CN | claimed |
| CN-120683600-A | Hafnium tantalum zirconium ternary carbide whisker and preparation method and application thereof | 西安工业大学 | 2025-09-23 | — | — | CN | disclosed |
| CN-120683600-A | Hafnium tantalum zirconium ternary carbide whisker and preparation method and application thereof | 西安工业大学 | 2025-09-23 | — | — | CN | disclosed |
| CN-110673435-B | Mask blank, phase shift mask and manufacturing method of semiconductor device | HOYA株式会社 | 2023-04-21 | — | — | CN | disclosed |
| CN-110554561-B | Mask blank, phase shift mask and manufacturing method of semiconductor device | HOYA株式会社 | 2023-03-21 | — | — | CN | disclosed |
| CN-112916870-B | Preparation method of medium-high entropy alloy material | 暨南大学 | 2022-11-01 | — | — | CN | disclosed |
| CN-112916870-A | Preparation method of medium-high entropy alloy material | 暨南大学 | 2021-06-08 | — | — | CN | disclosed |
| US-10942442-B2 | Mask blank, phase-shift mask, and method of manufacturing semiconductor device | HOYA CORPORATION (JP) | 2021-03-09 | — | — | US | disclosed |
| US-20200064727-A1 | MASK BLANK, PHASE-SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | HOYA CORPORATION (JP) | 2020-02-27 | — | — | US | disclosed |
| CN-110673435-A | Mask blank, phase shift mask and manufacturing method of semiconductor device | HOYA株式会社 | 2020-01-10 | — | — | CN | disclosed |
| US-9952497-B2 | Mask blank and method of manufacturing phase shift mask | HOYA CORPORATION (JP) | 2018-04-24 | — | — | US | disclosed |
| US-9726972-B2 | Mask blank, transfer mask, and method for manufacturing transfer mask | HOYA CORPORATION (JP) | 2017-08-08 | — | — | US | disclosed |
| US-20170176848-A1 | MASK BLANK, PHASE-SHIFT MASK, METHOD OF MANUFACTURING MASK BLANK, METHOD OF MANUFACTURING PHASE-SHIFT MASK AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | HOYA CORPORATION (JP) | 2017-06-22 | — | — | US | disclosed |
| US-9625806-B2 | Mask blank, phase-shift mask, and method for manufacturing the same | HOYA CORPORATION (JP) | 2017-04-18 | — | — | US | disclosed |
| US-20170023856-A1 | MASK BLANK AND METHOD OF MANUFACTURING PHASE SHIFT MASK | HOYA CORPORATION (JP) | 2017-01-26 | — | — | US | disclosed |
| US-9494852-B2 | Mask blank and method of manufacturing phase shift mask | HOYA CORPORATION (JP) | 2016-11-15 | — | — | US | disclosed |
| US-20160202603-A1 | MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING TRANSFER MASK | HOYA CORPORATION (JP) | 2016-07-14 | — | — | US | disclosed |
| US-20160202602-A1 | MASK BLANK, TRANSFER MASK AND METHODS OF MANUFACTURING THE SAME | HOYA CORPORATION (JP) | 2016-07-14 | — | — | US | disclosed |
| US-20150338731-A1 | MASK BLANK, PHASE-SHIFT MASK, AND METHOD FOR MANUFACTURING THE SAME | HOYA CORPORATION (JP) | 2015-11-26 | — | — | US | disclosed |
| US-20150198873-A1 | MASK BLANK AND METHOD OF MANUFACTURING PHASE SHIFT MASK | HOYA CORPORATION (JP) | 2015-07-16 | — | — | US | disclosed |