SCHEMBL339830

SCHEMBL339830

C=C(C(=O)O)C(F)C(F)(F)C(F)(F)C(F)C(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9546057 0.88
SCHEMBL6005610 0.88
SCHEMBL4949589 0.88
SCHEMBL28550596 0.86
SCHEMBL8394544 0.86
SCHEMBL4930948 0.83
SCHEMBL1448937 0.81
SCHEMBL2689625 0.80 TET2 (0.33)
SCHEMBL6028239 0.77
SCHEMBL1579160 0.77 THRB (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 204 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025110550-A1 COMPLEX FOR GENE DELIVERY 전남대학교산학협력단 2025-05-30 WO claimed
CN-117510740-A Drying-resistant swelling-resistant composite hydrogel and preparation method thereof 深圳大学 2024-02-06 CN claimed
EP-3833719-B1 DECORATED LEATHER MANUFACTURING AGFA NV (BE) 2023-01-04 EP claimed
US-11345835-B2 Pressure-sensitive adhesive tape, pressure-sensitive adhesive tape for affixing component for electronic appliance, and transparent pressure-sensitive adhesive tape for optical use SEKISUI CHEMICAL CO., LTD. (JP) 2022-05-31 US claimed
US-20210332255-A1 RADIATION CURABLE INKJET INKS AGFA NV (BE) 2021-10-28 US claimed
EP-3608373-B1 RADIATION CURABLE INKJET INKS AGFA NV (BE) 2021-10-06 EP claimed
US-20210292859-A1 DECORATED LEATHER MANUFACTURING AGFA NV (BE) 2021-09-23 US claimed
EP-3608373-A1 RADIATION CURABLE INKJET INKS AGFA NV (BE) 2020-02-12 EP claimed
US-8168690-B2 Optical discs; scratch resistance SONY CHEMICAL & INFORMATION DEVICE CORP. (JP) 2012-05-01 US claimed
EP-1777700-B1 NON-SOLVENT TYPE PHOTOCURABLE RESIN COMPOSITION FOR PROTECTION FILM SONY CHEM & INF DEVICE CORP (JP) 2011-11-16 EP claimed
EP-0887637-B1 Use of synthetic polymer particles as standards and calibrators in flow cytometry BAYER CORP (US) 2006-09-13 EP claimed
JP-3405732-B2 2003-05-12 JP claimed
US-6521729-B1 Monodisperse fluorine-containing synthetic polymer particles having a defined refractive index for use as standards and calibrators in flow cytometry BAYER CORPORATION 2003-02-18 US claimed
EP-0778804-B1 OPTICAL PELLICLE MEMBRANE TO FRAME ADHESION METHOD MICRO LITHOGRAPHY INC (US) 2002-08-28 EP claimed
US-6074879-A Synthetic polymer particles for use as standards and calibrators in flow cytometry BAYER CORPORATION (US) 2000-06-13 US claimed
EP-0778804-A4 OPTICAL PELLICLE MEMBRANE TO FRAME ADHESION METHOD MICRO LITHOGRAPHY INC (US) 1998-01-07 EP claimed
EP-0778804-A1 OPTICAL PELLICLE MEMBRANE TO FRAME ADHESION METHOD MICRO LITHOGRAPHY, INC. (US) 1997-06-18 EP claimed
WO-1996009183-A9 OPTICAL PELLICLE MEMBRANE TO FRAME ADHESION METHOD 1996-06-13 WO claimed
WO-1996009183-A1 OPTICAL PELLICLE MEMBRANE TO FRAME ADHESION METHOD MICRO LITHOGRAPHY, INC. (US) 1996-03-28 WO claimed
US-4842989-A Resist layer and process for forming resist pattern thereon MINOLTA CAMERA KABUSHIKI KAISHA (JP) 1989-06-27 US claimed