SCHEMBL340030

SCHEMBL340030

C=C[SiH2]C(C)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15134994 0.73
SCHEMBL340734 0.70
SCHEMBL3684808 0.70
SCHEMBL17499021 0.67
SCHEMBL6063944 0.65
SCHEMBL702325 0.65
SCHEMBL6062646 0.64
SCHEMBL29216629 0.63
SCHEMBL129236 0.61
SCHEMBL9419069 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020196786-A1 MAGNETIC PARTICLES AND TEST AGENT 積水化学工業株式会社 2020-10-01 WO disclosed
WO-2020196787-A1 MAGNETIC PARTICLES AND TEST AGENT 積水化学工業株式会社 2020-10-01 WO disclosed
CN-109314320-A Connection structural bodies, particle and bonding composition containing metallic atom 积水化学工业株式会社 2019-02-05 CN disclosed
CN-108699342-A Composite particle and liquid crystal display device 积水化学工业株式会社 2018-10-23 CN disclosed
CN-108700765-A Light control laminate and resin spacer for light control laminate 积水化学工业株式会社 2018-10-23 CN disclosed
US-9994681-B2 Organopolysiloxane prepolymer and a curable organopolysiloxane composition comprising the same HENKEL AG & CO. KGAA (DE) 2018-06-12 US disclosed
CN-108139286-A Semiconductor installation binding agent and semiconductor transducer 积水化学工业株式会社 2018-06-08 CN disclosed
CN-108139285-A Adhesive for mounting semiconductor sensor chip and semiconductor sensor 积水化学工业株式会社 2018-06-08 CN disclosed
CN-108138024-A Particle, connecting material, and connecting structure 积水化学工业株式会社 2018-06-08 CN disclosed
CN-107849426-A Connecting material and connection structural bodies 积水化学工业株式会社 2018-03-27 CN disclosed
CN-101855598-A Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORP 2010-10-06 CN disclosed
CN-101659731-A Conjugated diene polymer, conjugated diene polymer composition, and method for producing conjugated diene polymer SUMITOMO CHEMICAL CO 2010-03-03 CN disclosed
US-20090142593-A1 PRESSURE-SENSITIVE ADHESIVE TAPE NITTO DENKO CORPORATION (JP) 2009-06-04 US disclosed
EP-2065455-A1 Pressure-sensitive adhesive tape NITTO DENKO CORPORATION (JP) 2009-06-03 EP disclosed
US-7282535-B2 Thermoplastic resin composition KANEKA CORPORATION (JP) 2007-10-16 US disclosed
US-7015292-B2 Silicon-containing olefin copolymer, crosslinkable rubber composition thereof, and use thereof MITSUI CHEMICALS, INC. (JP) 2006-03-21 US disclosed
US-20050038214-A1 Silicon-containing olefin copolymer, crosslinkable rubber composition thereof, and use thereof MITSUI CHEMICALS, INC. (JP) 2005-02-17 US disclosed
US-20040147674-A1 Thermoplastic resin composition KANEKA CORPORATION (JP) 2004-07-29 US disclosed
EP-1398353-A1 THERMOPLASTIC RESIN COMPOSITION Kaneka Corporation (JP) 2004-03-17 EP disclosed
US-4596761-A Graft polymerized SiO2 lithographic masks HUGHES AIRCRAFT COMPANY (US) 1986-06-24 US disclosed