Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.50 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.42 |
| ▸ | FDPS | P14324 | 3/20 | 0.42 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | LCK | P06239 | 1/20 | 0.41 |
| ▸ | PPARD | Q03181 | 1/20 | 0.41 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.41 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 3/20 | 0.39 |
| ▸ | CA1 | P00915 | 2/20 | 0.39 |
| ▸ | LAP3 | P28838 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19811916 | 0.83 | FAAH (0.41) | TP53GPR84MAPTZDHHC20ZDHHC2 | |
| SCHEMBL1001330 | 0.81 | — | — | |
| SCHEMBL9377927 | 0.80 | TP53 (0.52) | TP53GPR84FDPSFFAR1LMNA | |
| SCHEMBL27374159 | 0.80 | TP53 (0.52) | TP53GPR84FDPSFFAR1LMNA | |
| SCHEMBL20420702 | 0.77 | TP53 (0.54) | TP53GPR84FDPSFFAR1LMNA | |
| SCHEMBL7765505 | 0.77 | TP53 (0.54) | TP53GPR84FDPSFFAR1LMNA | |
| SCHEMBL7785566 | 0.77 | TP53 (0.54) | TP53GPR84FDPSFFAR1LMNA | |
| SCHEMBL9460109 | 0.77 | TP53 (0.54) | TP53GPR84FDPSFFAR1LMNA | |
| SCHEMBL10695349 | 0.77 | TP53 (0.54) | TP53GPR84FDPSFFAR1LMNA | |
| SCHEMBL6241631 | 0.77 | TP53 (0.54) | TP53GPR84FDPSFFAR1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102124064-B | Composition for forming silicon-containing resist underlayer film with onium group | NISSAN CHEMICAL IND LTD | 2014-09-03 | — | — | CN | disclosed |
| CN-101946209-B | Silicon-containing resist underlayer film-forming composition containing cyclic amino group | NISSAN CHEMICAL IND LTD | 2014-01-22 | — | — | CN | disclosed |
| CN-101910949-B | Composition for forming resist underlayer film containing silicon and having urea group | NISSAN CHEMICAL IND LTD | 2013-07-24 | — | — | CN | disclosed |
| CN-101878451-B | Blocked isocyanato bearing silicon containing composition for the formation of resist undercoat | NISSAN CHEMICAL IND LTD | 2013-04-24 | — | — | CN | disclosed |
| CN-101558358-B | Resist underlayer film forming composition containing low molecular weight dissolution promoter | NISSAN CHEMICAL IND LTD | 2012-06-27 | — | — | CN | disclosed |
| CN-102124064-A | Composition for forming silicon-containing resist underlayer film with onium group | NISSAN CHEMICAL IND LTD | 2011-07-13 | — | — | CN | disclosed |
| CN-101946209-A | Silicon-containing resist underlayer film-forming composition containing cyclic amino group | NISSAN CHEMICAL IND LTD | 2011-01-12 | — | — | CN | disclosed |
| CN-101910949-A | Composition for forming resist underlayer film containing silicon and having urea group | NISSAN CHEMICAL IND LTD | 2010-12-08 | — | — | CN | disclosed |
| EP-2126074-B1 | USE OF ACETALS FOR THE ISOLATION OF NUCLEIC ACIDS | ROCHE DIAGNOSTICS GMBH (DE) | 2010-12-01 | — | — | EP | disclosed |
| CN-101878451-A | Blocked isocyanato bearing silicon containing composition for the formation of resist undercoat | NISSAN CHEMICAL IND LTD | 2010-11-03 | — | — | CN | disclosed |
| CN-101558358-A | Resist underlayer film forming composition containing low molecular weight dissolution promoter | NISSAN CHEMICAL IND LTD (JP) | 2009-10-14 | — | — | CN | disclosed |
| CN-101523291-A | Method for manufacturing semiconductor device using resist underlayer film formed by photo-crosslinking curing | NISSAN CHEMICAL IND LTD (JP) | 2009-09-02 | — | — | CN | disclosed |
| EP-0328102-B1 | NOVEL POLYVINYL ALCOHOL AND PROCESS FOR PRODUCING POLYVINYL ALCOHOL BY HYDROLYSIS CATALYSED BY ACIDS | Kuraray Co., Ltd. (JP) | 1993-05-12 | — | — | EP | disclosed |
| US-5047469-A | Novel polyvinyl alcohol and process for producing polyvinyl alcohol by hydrolysis catalyzed by acids | KURARAY CO., LTD. (JP) | 1991-09-10 | — | — | US | disclosed |
| EP-0328102-A2 | Novel polyvinyl alcohol and process for producing polyvinyl alcohol by hydrolysis catalysed by acids | Kuraray Co., Ltd. (JP) | 1989-08-16 | — | — | EP | disclosed |
| US-4456485-A | PRECIPITATION IN PRESENCE OF AMINE, PHOSPHORIC OR SULFONIC ACID ESTER, ETHYLENE OXIDE ADDUCTS, OR POLYPROPYLENE GLYCOL OR COPOLYMERS THEREOF | BASF WYANDOTTE CORPORATION (US) | 1984-06-26 | — | — | US | disclosed |
| US-4421516-A | Process for preparing discharge resist prints on hydrophobic textile materials | CASSELLA AKTIENGESELLSCHAFT (DE) | 1983-12-20 | — | — | US | disclosed |