SCHEMBL3409979

SCHEMBL3409979

C=C(C)c1ccc(Sc2ccc([S+](c3ccc(Sc4ccc(C(C)=O)cc4)cc3)c3ccc(Sc4ccc(C(C)=O)cc4)cc3)cc2)cc1

nearest known ligand 0.66

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.66
LMNA P02545 3/20 0.66
L3MBTL1 Q9Y468 2/20 0.66
ALDH1A1 P00352 1/20 0.58
MAPT P10636 5/20 0.37
RAB9A P51151 2/20 0.37
KMT2A Q03164 1/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
MAPK1 P28482 2/20 0.37
NPC1 O15118 1/20 0.37
STAT3 P40763 1/20 0.37
STAT1 P42224 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
HSD17B1 P14061 1/20 0.36
NOS3 P29474 2/20 0.34
NOS1 P29475 2/20 0.34
ALOX5 P09917 2/20 0.34
HRH3 Q9Y5N1 1/20 0.33
GAA P10253 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9888809 0.91 HPGD (0.79) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL9888772 0.91 HPGD (0.79) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL570189 0.91 HPGD (0.79) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL9888798 0.86 HPGD (0.70) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL9888851 0.84 HPGD (0.76) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL13056361 0.84 HPGD (0.76) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL29409683 0.84 HPGD (0.68) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL31556227 0.81 HPGD (0.63) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL1755726 0.81 HPGD (1.00) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL835108 0.81 HPGD (1.00) HPGDLMNAL3MBTL1ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120094222-A1 PHOTOCURABLE RESIN COMPOSITION, DRY FILM THEREOF, PATTERN FORMING METHOD, AND ELECTRICAL/ELECTRONIC PART PROTECTIVE FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-04-19 US disclosed