SCHEMBL835108

SCHEMBL835108

CC(=O)c1ccc(Sc2ccc(C(C)=O)cc2)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 4/20 1.00
LMNA P02545 2/20 1.00
L3MBTL1 Q9Y468 2/20 1.00
ALDH1A1 P00352 1/20 0.83
MAPT P10636 6/20 0.52
RAB9A P51151 4/20 0.52
KMT2A Q03164 1/20 0.52
SMN1; SMN2 Q16637 3/20 0.50
HSD17B1 P14061 1/20 0.50
MAPK1 P28482 2/20 0.46
NOS3 P29474 2/20 0.46
NOS1 P29475 2/20 0.46
NPC1 O15118 3/20 0.45
STAT3 P40763 1/20 0.45
STAT1 P42224 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
NR1H2 P55055 1/20 0.43
GAA P10253 1/20 0.43
TAAR1 Q96RJ0 1/20 0.42
STS P08842 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1755726 1.00 HPGD (1.00) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL10870776 0.91 HPGD (1.00) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL29955143 0.91 HPGD (0.83) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL5459292 0.91 HPGD (0.83) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL7938524 0.91 HPGD (0.83) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL194744 0.91 HPGD (1.00) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL10871476 0.91 HPGD (0.83) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL9888772 0.89 HPGD (0.79) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL12141690 0.89 HPGD (0.79) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL20591205 0.89 HPGD (0.79) HPGDLMNAL3MBTL1ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115960483-B Method for reducing shrinkage stress of photo-curing coating by using pH responsive cationic microgel 江南大学 2023-10-13 CN claimed
EP-0465738-A2 Process for producing tetraepoxy resins, epoxy resin compositions, tetraepoxy resins and tetrahydric phenol compounds DAINIPPON INK AND CHEMICALS, INC. (JP) 1992-01-15 EP claimed
US-4000187-A THERMAL STABILITY, COATINGS, CAST FILMS UNIVERSITY OF IOWA RESEARCH FOUNDATION (US) 1976-12-28 US claimed
CN-115960483-B Method for reducing shrinkage stress of photo-curing coating by using pH responsive cationic microgel 江南大学 2023-10-13 CN disclosed
CN-115960483-A Method for reducing shrinkage stress of photocureable coating by using pH-responsive cationic microgel 江南大学 2023-04-14 CN disclosed
US-11535703-B2 Methanesulfonic acid mediated solvent free synthesis of conjugated porous polymer networks THE TEXAS A&M UNIVERSITY SYSTEM (US) 2022-12-27 US disclosed
CN-111517902-B Aerobic oxidation system containing sulfinic acid, sulfonic acid or derivatives thereof and photo-oxidation promoting method thereof 清华大学 2022-06-14 CN disclosed
US-20210230359-A1 Methanesulfonic Acid Mediated Solvent Free Synthesis of Conjugated Porous Polymer Networks THE TEXAS A&M UNIVERSITY SYSTEM 2021-07-29 US disclosed
US-10934389-B2 Methanesulfonic acid mediated solvent free synthesis of conjugated porous polymer networks THE TEXAS A&M UNIVERSITY SYSTEM (US) 2021-03-02 US disclosed
CN-111517902-A Aerobic oxidation system containing sulfinic acid, sulfonic acid or derivatives thereof and photo-oxidation promoting method thereof 清华大学 2020-08-11 CN disclosed
US-20200148812-A1 Methanesulfonic Acid Mediated Solvent Free Synthesis of Conjugated Porous Polymer Networks THE TEXAS A&M UNIVERSITY SYSTEM 2020-05-14 US disclosed
US-5723573-A ACETYLENIC END GROUPS HITACHI CHEMICAL COMPANY, LTD. (JP) 1998-03-03 US disclosed
EP-0465738-A2 Process for producing tetraepoxy resins, epoxy resin compositions, tetraepoxy resins and tetrahydric phenol compounds DAINIPPON INK AND CHEMICALS, INC. (JP) 1992-01-15 EP disclosed
EP-0444142-A4 POLYQUINOLINE COPOLYMERS 1991-10-16 EP disclosed
EP-0444142-A1 POLYQUINOLINE COPOLYMERS HITACHI CHEMICAL CO., LTD. (JP) 1991-09-04 EP disclosed
US-5017677-A Molding materials, laminates, adhesives, films and fibers COLORADO STATE UNIVERSITY RESEARCH FOUNDATION (US) 1991-05-21 US disclosed
WO-1990005754-A1 POLYQUINOLINE COPOLYMERS COLORADO STATE UNIVERSITY RESEARCH FOUNDATION (US) 1990-05-31 WO disclosed
EP-0192167-A1 Use of thio-substitued ketones as photoinitiators MERCK PATENT GmbH (DE) 1986-08-27 EP disclosed
US-4251341-A DIALKOXY-ACETYL DERIVATIVES OF AROMATIC COMPOUNDS CIBA-GEIGY CORPORATION (US) 1981-02-17 US disclosed
US-4000187-A THERMAL STABILITY, COATINGS, CAST FILMS UNIVERSITY OF IOWA RESEARCH FOUNDATION (US) 1976-12-28 US disclosed