⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12026562 | 1.00 | — | — | |
| SCHEMBL15692355 | 0.84 | — | — | |
| SCHEMBL12122880 | 0.81 | LMNA (0.30) | — | |
| SCHEMBL12026571 | 0.81 | LMNA (0.30) | — | |
| SCHEMBL3412401 | 0.81 | LMNA (0.30) | — | |
| SCHEMBL4582178 | 0.79 | — | — | |
| SCHEMBL6891276 | 0.74 | — | — | |
| SCHEMBL401651 | 0.74 | — | — | |
| SCHEMBL19928637 | 0.73 | — | — | |
| SCHEMBL3870902 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9115074-B2 | Fluorinated monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-25 | — | — | US | disclosed |
| US-9115074-B2 | Fluorinated monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-25 | — | — | US | disclosed |
| US-9086628-B2 | Resist protective film-forming composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-21 | — | — | US | disclosed |
| US-8945809-B2 | Fluorinated monomer, fluorinated polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-03 | — | — | US | disclosed |
| US-8933251-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-01-13 | — | — | US | disclosed |
| US-8933251-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-01-13 | — | — | US | disclosed |
| US-8916331-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-23 | — | — | US | disclosed |
| US-20140114080-A1 | FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-04-24 | — | — | US | disclosed |
| US-20140114080-A1 | FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-04-24 | — | — | US | disclosed |
| US-8647808-B2 | Fluorinated monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-11 | — | — | US | disclosed |
| US-7488567-B2 | Polymer, resist composition and patterning process | PANASONIC CORPORATION (JP) | 2009-02-10 | — | — | US | disclosed |
| US-20080118860-A1 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-22 | — | — | US | disclosed |
| US-20080118860-A1 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-22 | — | — | US | disclosed |
| US-20080090173-A1 | POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-17 | — | — | US | disclosed |
| US-20080090173-A1 | POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-17 | — | — | US | disclosed |
| US-20080085466-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-10 | — | — | US | disclosed |
| US-20080085466-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-10 | — | — | US | disclosed |
| EP-1652846-B1 | Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2007-08-22 | — | — | EP | disclosed |
| US-20070128555-A1 | Novel ester compound, polymer, resist composition, and patterning process | CENTRAL GLASS CO., LTD. | 2007-06-07 | — | — | US | disclosed |
| US-20070128555-A1 | Novel ester compound, polymer, resist composition, and patterning process | CENTRAL GLASS CO., LTD. | 2007-06-07 | — | — | US | disclosed |