⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12898483 | 0.85 | — | — | |
| SCHEMBL12898451 | 0.85 | — | — | |
| SCHEMBL6297160 | 0.84 | TSHR (0.47) | — | |
| SCHEMBL6300224 | 0.80 | — | — | |
| SCHEMBL3481640 | 0.79 | — | — | |
| SCHEMBL12898518 | 0.79 | — | — | |
| SCHEMBL12898455 | 0.75 | — | — | |
| SCHEMBL3481529 | 0.75 | — | — | |
| SCHEMBL16496984 | 0.75 | — | — | |
| SCHEMBL9238298 | 0.73 | TSHR (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 607 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119119950-A | Adhesion promoters for composite materials and methods thereof | 波音公司 | 2024-12-13 | — | — | CN | claimed |
| CN-118539001-A | Electrolyte and secondary battery | 远景动力技术(江苏)有限公司 | 2024-08-23 | — | — | CN | claimed |
| CN-110709259-B | Rubber composition | 米其林集团总公司 | 2022-07-15 | — | — | CN | claimed |
| CN-110719934-B | Functionalized ethylene and 1, 3-butadiene copolymers | 米其林集团总公司 | 2022-06-24 | — | — | CN | claimed |
| CN-110709463-B | Functionalized copolymers composed of 1, 3-dienes and olefins | 米其林集团总公司 | 2022-04-15 | — | — | CN | claimed |
| US-11155656-B2 | Functional ethylene and 1,3-butadiene copolymer | COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN (FR) | 2021-10-26 | — | — | US | claimed |
| US-20210079135-A1 | RUBBER COMPOSITION | COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN (FR) | 2021-03-18 | — | — | US | claimed |
| US-20200157268-A1 | FUNCTIONAL COPOLYMER CONSISTING OF A 1,3-DIENE AND AN OLEFINE | COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN (FR) | 2020-05-21 | — | — | US | claimed |
| US-20200140587-A1 | FUNCTIONAL ETHYLENE AND 1,3-BUTADIENE COPOLYMER | COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN (FR) | 2020-05-07 | — | — | US | claimed |
| EP-3634776-A1 | RUBBER COMPOSITION | Compagnie Générale des Etablissements Michelin (FR) | 2020-04-15 | — | — | EP | claimed |
| US-7202564-B2 | Advanced low dielectric constant organosilicon plasma chemical vapor deposition films | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-04-10 | — | — | US | claimed |
| US-20060202311-A1 | LOW k DIELECTRIC CVD FILM FORMATION PROCESS WITH IN-SITU IMBEDDED NANOLAYERS TO IMPROVE MECHANICAL PROPERTIES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-09-14 | — | — | US | claimed |
| WO-2006096813-A2 | LOW K DIELECTRIC CVD FILM FORMATION PROCESS WITH IN-SITU IMBEDDED NANOLAYERS TO IMPROVE MECHANICAL PROPERTIES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-09-14 | — | — | WO | claimed |
| WO-2006088881-A2 | ADVANCED LOW DIELECTRIC CONSTANT ORGANOSILICON PLASMA CHEMICAL VAPOR DEPOSITION FILMS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-08-24 | — | — | WO | claimed |
| US-20060183345-A1 | ADVANCED LOW DIELECTRIC CONSTANT ORGANOSILICON PLASMA CHEMICAL VAPOR DEPOSITION FILMS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-08-17 | — | — | US | claimed |
| WO-2006022856-A2 | DUV LASER ANNEALING AND STABILIZATION OF SiCOH FILMS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-03-02 | — | — | WO | claimed |
| US-20060040513-A1 | DUV laser annealing and stabilization of SiCOH films | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-02-23 | — | — | US | claimed |
| US-6410770-B2 | REDUCTION OF ALKOXYSILANE IN PRESENCE OF ALKALI METAL HYDRIDE AND HIGH BOILING SOLVENTS | GELEST, INC. | 2002-06-25 | — | — | US | claimed |
| US-20020002299-A1 | Chloride-free process for the production of alkylsilanes suitable for microelectronic applications | GELEST, INC. | 2002-01-03 | — | — | US | claimed |
| WO-2001058908-A2 | CHLORIDE-FREE PROCESS FOR THE PRODUCTION OF ALKYLSILANES SUITABLE FOR MICROELECTRONIC APPLICATIONS | GELEST, INC. (US) | 2001-08-16 | — | — | WO | claimed |