SCHEMBL3411630

SCHEMBL3411630

C=C(C#N)SC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7751418 0.76 ALDH1A1 (0.46)
SCHEMBL7848073 0.72
Methylsulfanylmethane SCHEMBL27597241 0.69
Ethylene SCHEMBL1897636 0.67
SCHEMBL9710754 0.67 ALDH1A1 (0.45)
SCHEMBL9710760 0.67 ALDH1A1 (0.45)
SCHEMBL11275345 0.67
SCHEMBL9874604 0.67
SCHEMBL10453215 0.67
SCHEMBL8057286 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113130994-A Electrolyte and electrochemical device comprising same 深圳市研一新材料有限责任公司 2021-07-16 CN claimed
EP-1173472-A1 CYCLIC HEXAPEPTIDES HAVING ANTIBIOTIC ACTIVITY FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 2002-01-23 EP claimed
WO-2000064927-A1 CYCLIC HEXAPEPTIDES HAVING ANTIBIOTIC ACTIVITY FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 2000-11-02 WO claimed
CN-114450277-A Substituted pyrimidines for the treatment and prevention of hepatitis B virus infection 豪夫迈·罗氏有限公司 2022-05-06 CN disclosed
CN-113130994-A Electrolyte and electrochemical device comprising same 深圳市研一新材料有限责任公司 2021-07-16 CN disclosed
EP-2265610-A1 PYRAZOLE [3, 4-B]PYRIDINE RAF INHIBITORS Array Biopharma, Inc. (US) 2010-12-29 EP disclosed
WO-2009111279-A1 PYRAZOLE [3, 4-B] PYRIDINE RAF INHIBITORS ARRAY BIOPHARMA INC. (US) 2009-09-11 WO disclosed
US-20090202791-A1 ULTRAVIOLET-CURABLE POLYMER COMPOSITION, RESIN MOLDED ARTICLE AND METHOD FOR PRODUCING SAME JSR CORPORATION (JP) 2009-08-13 US disclosed
US-20090181948-A1 DIAMINE DERIVATIVE KYOWA HAKKO KOGYO CO., LTD. (JP) 2009-07-16 US disclosed
US-20080227893-A1 Liquid Composition Containing Hollow Particle, Process For Producing The Same, And Optical Article JSR CORPORATION (JP) 2008-09-18 US disclosed
WO-2008109613-A1 BENZO[C][2,7]NAPHTHYRIDINE DERIVATIVES, AND THEIR USE AS KINASE INHIBITORS WYETH (US) 2008-09-12 WO disclosed
CN-1236780-A Pyrazolopyrimidines and pyrazolotriazines HOFFMANN LA ROCHE (CH) 1999-12-01 CN disclosed
US-5861232-A FLEXOGRAPHIC PLATE NIPPON PAINT CO., LTD. (JP) 1999-01-19 US disclosed
EP-0745900-B1 Water-developing photosensitive resin composition NIPPON PAINT CO LTD (JP) 1998-12-30 EP disclosed
EP-0864927-A1 Water-developable photosensitive resin composition JSR Corporation (JP) 1998-09-16 EP disclosed
US-5736298-A COMPRISES A PARTICULATE POLYMER OF A CARBOXY-GROUP-CONTAINING-DIENE HAVING A CROSSLINKED STRUCTURE JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-04-07 US disclosed
US-5731128-A ELASTICITY, HARDNESS, ELONGATION; WATER DEVELOPABILITY NIPPON PAINT CO., LTD. (JP) 1998-03-24 US disclosed
EP-0745900-A1 Water-developing photosensitive resin composition Nippon Paint Co., Ltd. (JP) 1996-12-04 EP disclosed
EP-0607962-B1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-07-17 EP disclosed
EP-0607962-A1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-07-27 EP disclosed