Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1336247 | 1.00 | MEN1 (0.39) | MEN1KMT2ATDP1 | |
| SCHEMBL24732508 | 1.00 | MEN1 (0.39) | MEN1KMT2ATDP1 | |
| SCHEMBL14279967 | 0.95 | MEN1 (0.31) | MEN1KMT2ATDP1 | |
| SCHEMBL14279972 | 0.95 | MEN1 (0.31) | MEN1KMT2ATDP1 | |
| SCHEMBL33635 | 0.95 | MEN1 (0.31) | MEN1KMT2ATDP1 | |
| SCHEMBL3217838 | 0.90 | — | — | |
| SCHEMBL3458732 | 0.90 | MEN1 (0.39) | MEN1KMT2ATDP1 | |
| SCHEMBL112086 | 0.90 | MEN1 (0.39) | MEN1KMT2ATDP1 | |
| SCHEMBL1608601 | 0.90 | MEN1 (0.39) | MEN1KMT2ATDP1 | |
| SCHEMBL9907096 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9023576-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| US-8900791-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition | FUJIFILM CORPORATION (JP) | 2014-12-02 | — | — | US | disclosed |
| US-8313886-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-20 | — | — | US | disclosed |
| US-8268528-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-09-18 | — | — | US | disclosed |
| US-8158330-B2 | Resist protective coating composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-04-17 | — | — | US | disclosed |
| US-8101335-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-24 | — | — | US | disclosed |
| US-8039200-B2 | Photosensitive composition and pattern-forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2011-10-18 | — | — | US | disclosed |
| US-20110171577-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-14 | — | — | US | disclosed |
| US-7923199-B2 | Using a sulfonium acid generator that forms a fluorine-substituted sulfonic acid compound; improved in the exposure latitude, pitch dependency and line edge roughness and enhanced in the sensitivity and resolution at the exposure with EUV light | FUJIFILM CORPORATION (JP) | 2011-04-12 | — | — | US | disclosed |
| US-20110076622-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20100266957-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-10-21 | — | — | US | disclosed |
| US-20100136482-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-03 | — | — | US | disclosed |
| US-20090286182-A1 | RESIST PROTECTIVE COATING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |
| US-20090280434-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-12 | — | — | US | disclosed |
| US-7569323-B2 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-04 | — | — | US | disclosed |
| US-7541131-B2 | Resist composition, compound for use in the resist composition and pattern forming method using the resist composition | FUJIFILM CORPORATION (JP) | 2009-06-02 | — | — | US | disclosed |
| US-7510822-B2 | Stimulation sensitive composition and compound | FUJIFILM CORPORATION (JP) | 2009-03-31 | — | — | US | disclosed |
| US-7455952-B2 | Patterning process and resist overcoat material | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-11-25 | — | — | US | disclosed |
| US-7442815-B2 | Homo- or copolymerizing 2,2,3,3,4,5-hexafluoro-2,3-dihydrofuran derivative or fluorinated 1,2-didehydrooxetane, or dihydropyran derivative; transmittance and durability against short wavelength light; photolithography using KrF excimer lasers; clarity, radiation transparent | ASAHI GLASS COMPANY, LIMITED (JP) | 2008-10-28 | — | — | US | disclosed |
| US-7202014-B2 | Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition | FUJIFILM CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110171577-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | ARSA, RAD51, ARID2 | MEN1 2393/4885KMT2A 2772/4885TDP1 3244/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.