⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10198635 | 1.00 | — | — | |
| SCHEMBL3456333 | 1.00 | — | — | |
| SCHEMBL1604317 | 0.80 | — | — | |
| SCHEMBL14441066 | 0.80 | — | — | |
| SCHEMBL820453 | 0.80 | — | — | |
| SCHEMBL331684 | 0.80 | — | — | |
| SCHEMBL21098299 | 0.80 | CYP2C9 (0.33) | — | |
| SCHEMBL16281053 | 0.80 | CA1 (0.38) | — | |
| Ammonia Solution, Strong SCHEMBL29178203 | 0.77 | — | — | |
| SCHEMBL15694242 | 0.74 | FUCA1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11009790-B2 | Photoacid generator and photoresist composition including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-05-18 | — | — | US | disclosed |
| US-20180031967-A1 | PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-02-01 | — | — | US | disclosed |
| US-20180031967-A1 | PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-02-01 | — | — | US | disclosed |
| WO-2016193188-A1 | METHOD FOR PRODUCING ORGANOSILICON COMPOUNDS HAVING AMINO ACID GROUPS | WACKER CHEMIE AG (DE) | 2016-12-08 | — | — | WO | disclosed |
| US-20160096978-A1 | COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-07 | — | — | US | disclosed |
| US-20160096977-A1 | COMPOSITION FOR FORMING A COATING TYPE SILICON-CONTAINING FILM, SUBSTRATE, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-07 | — | — | US | disclosed |
| US-9248693-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-02 | — | — | US | disclosed |
| US-9086628-B2 | Resist protective film-forming composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-21 | — | — | US | disclosed |
| US-8945809-B2 | Fluorinated monomer, fluorinated polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-03 | — | — | US | disclosed |
| US-8916331-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-23 | — | — | US | disclosed |
| EP-1720064-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2006-11-08 | — | — | EP | disclosed |
| US-20060223001-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-05 | — | — | US | disclosed |
| EP-1679314-A1 | SILANE COMPOUND, POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-07-12 | — | — | EP | disclosed |
| US-20050171226-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2005-08-04 | — | — | US | disclosed |
| US-6908722-B2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-06-21 | — | — | US | disclosed |
| US-20040067436-A1 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-04-08 | — | — | US | disclosed |
| WO-2003082350-A2 | RADIOLABELLED QUINOLINE AND QUINOLINONE DERIVATIVES AND THEIR USE AS METABOTROPIC GLUTAMATE RECEPTOR LIGANDS | JANSSEN PHARMACEUTICA N.V. (BE) | 2003-10-09 | — | — | WO | disclosed |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| EP-1270553-A2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-01-02 | — | — | EP | disclosed |
| US-4524223-A | CHROMATOGRAPHIC SEPARATION OF DIASTEREOMERIC ESTERS | UOP INC. (US) | 1985-06-18 | — | — | US | disclosed |