SCHEMBL21098299

SCHEMBL21098299

OC1C[C@@H]2C[C@H]3CC(O)[C@H](CC3O)C[C@H]3CC(O)[C@H](CC3O)C[C@H]3CC(O)[C@H](CC3O)C[C@H]3CC(O)[C@H](CC3O)C[C@H]1CC2O

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14441066 1.00
SCHEMBL1604317 1.00
SCHEMBL820453 1.00
SCHEMBL17491564 0.83 CYP2C9 (0.32) CYP2C9
SCHEMBL23498787 0.80
SCHEMBL3456333 0.80
SCHEMBL3414702 0.80
SCHEMBL10198635 0.80
SCHEMBL15196655 0.80
SCHEMBL5558327 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190187052-A1 MATERIAL FOR DETECTING PHOTORESIST AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2019-06-20 US disclosed