SCHEMBL3415232

SCHEMBL3415232

Oc1ccc(-c2ccccc2)c(C2(c3cc(O)ccc3-c3ccccc3)c3ccccc3-c3ccccc32)c1

nearest known ligand 0.55

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 1/20 0.55
PDK2 Q15119 4/20 0.51
ESR2 Q92731 7/20 0.50
BACE1 P56817 1/20 0.42
BCL2L1 Q07817 2/20 0.41
ALDH1A1 P00352 1/20 0.41
HPGD P15428 1/20 0.41
HSD17B10 Q99714 1/20 0.41
ESR1 P03372 7/20 0.41
HSP90AA1 P07900 1/20 0.41
THRB P10828 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
ABL1 P00519 1/20 0.40
ABCB1 P08183 1/20 0.40
BCR P11274 1/20 0.40
MMP3 P08254 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21391631 0.91 PDK2 (0.59) ALOX5PDK2ESR2ALDH1A1HPGD
SCHEMBL20941772 0.91 PDK2 (0.59) ALOX5PDK2ESR2ALDH1A1HPGD
SCHEMBL31668465 0.91 PDK2 (0.59) ALOX5PDK2ESR2ALDH1A1HPGD
SCHEMBL30003384 0.91 PDK2 (0.59) ALOX5PDK2ESR2ALDH1A1HPGD
SCHEMBL789268 0.91 PDK2 (0.59) ALOX5PDK2ESR2ALDH1A1HPGD
SCHEMBL30511893 0.91 PDK2 (0.59) ALOX5PDK2ESR2ALDH1A1HPGD
SCHEMBL3446444 0.87 PDK2 (0.53) ALOX5PDK2ESR2BACE1BCL2L1
SCHEMBL20218919 0.84 PDK2 (0.53) ALOX5PDK2ESR2ALDH1A1HPGD
SCHEMBL29638158 0.84 PDK2 (0.53) ALOX5PDK2ESR2ALDH1A1HPGD
SCHEMBL30697106 0.84 PDK2 (0.53) ALOX5PDK2ESR2ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8349533-B2 Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-08 US disclosed
US-20100119970-A1 Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-05-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100119970-A1 Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process SCO2, CA1, LCT ALOX5 175/4885PDK2 3757/4885ESR2 3986/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.