⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Nitrous Oxide SCHEMBL2299393 | 1.00 | — | — | |
| Nitrous Oxide SCHEMBL30536430 | 0.94 | — | — | |
| Nitrous Oxide SCHEMBL18984005 | 0.93 | — | — | |
| Nitrous Oxide SCHEMBL1332593 | 0.93 | — | — | |
| Nitrous Oxide SCHEMBL30367014 | 0.93 | — | — | |
| Nitrous Oxide SCHEMBL25305708 | 0.86 | — | — | |
| Nitrous Oxide SCHEMBL5880692 | 0.86 | — | — | |
| Nitrous Oxide SCHEMBL600798 | 0.86 | — | — | |
| Nitrous Oxide SCHEMBL22832173 | 0.86 | — | — | |
| Nitrous Oxide SCHEMBL2160900 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 152 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6555852-B1 | Bipolar transistor having an emitter comprised of a semi-insulating material | AGERE SYSTEMS INC. | 2003-04-29 | — | — | US | claimed |
| US-5650040-A | Interfacial etch of silica to improve adherence of noble metals | MICRON TECHNOLOGY, INC. (US) | 1997-07-22 | — | — | US | claimed |
| US-12038405-B2 | Methods and apparatus for measuring analytes | Life Technologies Corporation (US) | 2024-07-16 | — | — | US | disclosed |
| US-20240201126-A1 | METHODS AND APPARATUS FOR MEASURING ANALYTES | Life Technologies Corporation | 2024-06-20 | — | — | US | disclosed |
| US-20240085368-A1 | METHODS AND APPARATUS FOR MEASURING ANALYTES | Life Technologies Corporation | 2024-03-14 | — | — | US | disclosed |
| US-11874250-B2 | Integrated sensor arrays for biological and chemical analysis | Life Technologies Corporation (US) | 2024-01-16 | — | — | US | disclosed |
| US-11768171-B2 | Methods and apparatus for measuring analytes | Life Technologies Corporation (US) | 2023-09-26 | — | — | US | disclosed |
| EP-4220146-A1 | APPARATUS FOR MEASURING ANALYTES WITH AN EXTENDED FLOATING GATE SURFACE AREA | Life Technologies Corporation (US) | 2023-08-02 | — | — | EP | disclosed |
| US-11692964-B2 | Methods and apparatus for measuring analytes | Life Technologies Corporation (US) | 2023-07-04 | — | — | US | disclosed |
| US-20230152271-A1 | METHODS AND APPARATUS FOR MEASURING ANALYTES | Life Technologies Corporation | 2023-05-18 | — | — | US | disclosed |
| US-11530444-B2 | Methods and apparatus for measuring analytes using large scale FET arrays | Life Technologies Corporation (US) | 2022-12-20 | — | — | US | disclosed |
| US-20100137143-A1 | METHODS AND APPARATUS FOR MEASURING ANALYTES | ION TORRENT SYSTEMS INCORPORATED (US) | 2010-06-03 | — | — | US | disclosed |
| WO-2010047804-A1 | INTEGRATED SENSOR ARRAYS FOR BIOLOGICAL AND CHEMICAL ANALYSIS | ION TORRENT SYSTEMS INCORPORATED (US) | 2010-04-29 | — | — | WO | disclosed |
| WO-2010008480-A2 | METHODS AND APPARATUS FOR MEASURING ANALYTES USING LARGE SCALE FET ARRAYS | ION TORRENT SYSTEMS INCORPORATED (US) | 2010-01-21 | — | — | WO | disclosed |
| WO-2009158006-A2 | METHODS AND APPARATUS FOR DETECTING MOLECULAR INTERACTIONS USING FET ARRAYS | ION TORRENT SYSTEMS INCORPORATED (US) | 2009-12-30 | — | — | WO | disclosed |
| US-6555852-B1 | Bipolar transistor having an emitter comprised of a semi-insulating material | AGERE SYSTEMS INC. | 2003-04-29 | — | — | US | disclosed |
| US-5668380-A | Reduced area metal contact to a thin polysilicon layer contact structure having low ohmic resistance | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD (TW) | 1997-09-16 | — | — | US | disclosed |
| US-5650040-A | Interfacial etch of silica to improve adherence of noble metals | MICRON TECHNOLOGY, INC. (US) | 1997-07-22 | — | — | US | disclosed |
| US-5650040-A | Interfacial etch of silica to improve adherence of noble metals | MICRON TECHNOLOGY, INC. (US) | 1997-07-22 | — | — | US | disclosed |
| US-5534451-A | THIN FILM TRANSISTORS, HIGH DENSITY INTEGRATED CIRCUITS | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY (TW) | 1996-07-09 | — | — | US | disclosed |