⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10815842 | 0.75 | — | — | |
| SCHEMBL128859 | 0.75 | — | — | |
| SCHEMBL127653 | 0.75 | — | — | |
| SCHEMBL28612 | 0.73 | — | — | |
| SCHEMBL28841410 | 0.72 | — | — | |
| SCHEMBL7600513 | 0.72 | — | — | |
| SCHEMBL11426097 | 0.72 | — | — | |
| SCHEMBL476942 | 0.72 | — | — | |
| SCHEMBL10813455 | 0.72 | — | — | |
| SCHEMBL1670367 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110072862-B | Bicyclic nitrogen-containing heterocyclic derivative and pharmaceutical composition containing the same | 盐野义制药株式会社 | 2022-05-13 | — | — | CN | disclosed |
| EP-2414896-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORP (JP) | 2020-11-11 | — | — | EP | disclosed |
| CN-111801330-A | Fused ring compounds having dopamine D3 receptor antagonism | 盐野义制药株式会社 | 2020-10-20 | — | — | CN | disclosed |
| EP-2356516-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORP (JP) | 2017-10-25 | — | — | EP | disclosed |
| EP-2356517-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORP (JP) | 2017-01-25 | — | — | EP | disclosed |
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-9152048-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-10-06 | — | — | US | disclosed |
| US-8846290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-09-30 | — | — | US | disclosed |
| US-8795944-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8771916-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-07-08 | — | — | US | disclosed |
| EP-1244548-A2 | HEAT-SENSITIVE IMAGING ELEMENT FOR PROVIDING LITHOGRAPHIC PRINTING PLATES | Kodak Polychrome Graphics Company Ltd. (US) | 2002-10-02 | — | — | EP | disclosed |
| US-6451500-B1 | Imaging member containing heat switchable carboxylate polymer and method of use | KODAK POLYCHROME GRAPHICS LLC | 2002-09-17 | — | — | US | disclosed |
| WO-2001039985-A2 | HEAT-SENSITIVE IMAGING ELEMENT FOR PROVIDING LITHOGRAPHIC PRINTING PLATES | KODAK POLYCHROME GRAPHICS CO. LTD. (US) | 2001-06-07 | — | — | WO | disclosed |
| US-6239145-B1 | USABLE IN ACQUIRING INFORMATION ABOUT ACTIVE OXYGEN OR IN VIVO FREE RADICALS AS BIOLOGICAL IMAGES SUCH AS MAGNETIC RESONANCE IMAGES OR MAGNETOENCEPHALOGRAMS; | DAIITCHI RADIOISOTOPE LABORATORIES, LTD. (JP) | 2001-05-29 | — | — | US | disclosed |
| EP-0995740-A1 | NOVEL NITROXYL COMPOUNDS AND DRUGS AND REAGENTS CONTAINING THE SAME AS THE ACTIVE INGREDIENT | DAIICHI RADIOISOTOPE LABORATORIES, LTD. (JP) | 2000-04-26 | — | — | EP | disclosed |
| EP-0559860-B1 | HALOVINYL-DERIVATIVES | HOFFMANN LA ROCHE (CH) | 1996-02-14 | — | — | EP | disclosed |
| US-5364556-A | Halovinyl-derivatives | HOFFMANN-LA ROCHE INC. (US) | 1994-11-15 | — | — | US | disclosed |
| EP-0559860-A1 | HALOVINYL-DERIVATIVES. | HOFFMANN LA ROCHE (CH) | 1993-09-15 | — | — | EP | disclosed |
| WO-1993007234-A1 | HALOVINYL-DERIVATIVES | F. HOFFMANN-LA ROCHE AG (CH) | 1993-04-15 | — | — | WO | disclosed |
| US-5093370-A | Useful prior to insertion of tracheotomy tube or discission | TOBISHI YAKUHIN KOGYO KABUSHIKI KAISHA (JP) | 1992-03-03 | — | — | US | disclosed |