Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | BID | P55957 | 3/20 | 0.41 |
| ▸ | MCL1 | Q07820 | 3/20 | 0.41 |
| ▸ | PPARA | Q07869 | 3/20 | 0.41 |
| ▸ | BCL2L1 | Q07817 | 2/20 | 0.41 |
| ▸ | BAK1 | Q16611 | 2/20 | 0.41 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.41 |
| ▸ | PPARG | P37231 | 2/20 | 0.41 |
| ▸ | EP300 | Q09472 | 1/20 | 0.41 |
| ▸ | KAT2A | Q92830 | 1/20 | 0.41 |
| ▸ | KAT2B | Q92831 | 1/20 | 0.41 |
| ▸ | KAT5 | Q92993 | 1/20 | 0.41 |
| ▸ | SAE1 | Q9UBE0 | 1/20 | 0.41 |
| ▸ | CYSLTR2 | Q9NS75 | 8/20 | 0.39 |
| ▸ | CYSLTR1 | Q9Y271 | 8/20 | 0.39 |
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30712327 | 0.93 | ALDH1A1 (0.43) | ALDH1A1LMNAMAPK1BIDMCL1 | |
| SCHEMBL475422 | 0.93 | ALDH1A1 (0.43) | ALDH1A1LMNAMAPK1BIDMCL1 | |
| SCHEMBL15324514 | 0.91 | ALDH1A1 (0.46) | ALDH1A1LMNAMAPK1BIDMCL1 | |
| SCHEMBL8370214 | 0.91 | ALDH1A1 (0.46) | ALDH1A1LMNAMAPK1BIDMCL1 | |
| SCHEMBL29108039 | 0.88 | ALDH1A1 (0.43) | ALDH1A1LMNAMAPK1BIDMCL1 | |
| SCHEMBL228932 | 0.81 | ALDH1A1 (0.44) | ALDH1A1LMNAMAPK1 | |
| Octane SCHEMBL9181018 | 0.81 | ALDH1A1 (0.59) | ALDH1A1LMNAMAPK1 | |
| SCHEMBL2873847 | 0.79 | ALDH1A1 (0.53) | ALDH1A1LMNAMAPK1BIDMCL1 | |
| SCHEMBL15861897 | 0.78 | ALDH1A1 (0.42) | ALDH1A1LMNAMAPK1CYSLTR2CYSLTR1 | |
| SCHEMBL27481403 | 0.77 | ALDH1A1 (0.46) | ALDH1A1LMNAMAPK1BIDMCL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 264 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150024326-A1 | PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | KAYAKU ADVANCED MATERIALS, INC. | 2015-01-22 | — | — | US | claimed |
| WO-2013134104-A2 | PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES | MICROCHEM CORP. (US) | 2013-09-12 | — | — | WO | claimed |
| US-20240218174-A1 | THERMOPLASTIC RESIN COMPOSITION, METHOD OF PREPARING THE SAME, AND MOLDED ARTICLE INCLUDING THE SAME | LG CHEM, LTD. (KR) | 2024-07-04 | — | — | US | disclosed |
| US-12024632-B2 | Near infrared absorbing composition, near infrared cut filter, solid state image sensor, and camera module | Konica Minolta, Inc. (JP) | 2024-07-02 | — | — | US | disclosed |
| CN-118234799-A | Thermoplastic resin composition, method for producing the same, and molded article comprising the same | 株式会社LG化学 | 2024-06-21 | — | — | CN | disclosed |
| US-20240192601-A1 | PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2024-06-13 | — | — | US | disclosed |
| EP-4382570-A1 | POLYCARBONATE RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND MOLDED ARTICLE COMPRISING SAME | LG Chem, Ltd. (KR) | 2024-06-12 | — | — | EP | disclosed |
| EP-4378999-A1 | THERMOPLASTIC RESIN COMPOSITION, METHOD FOR PRODUCING SAME, AND MOLDED ARTICLE INCLUDING SAME | LG Chem, Ltd. (KR) | 2024-06-05 | — | — | EP | disclosed |
| CN-113805435-B | Photoresist and method | 台湾积体电路制造股份有限公司 | 2024-05-28 | — | — | CN | disclosed |
| US-11971657-B2 | Photoresist developer and method of developing photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-04-30 | — | — | US | disclosed |
| US-11971659-B2 | Photoresist composition and method of forming photoresist pattern | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-04-30 | — | — | US | disclosed |
| EP-1375182-A1 | RECORDING MATERIAL AND RECORDING SHEET | NIPPON SODA CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-6633722-B1 | Light guide plate with alicyclic resin | NIPPON ZEON CO., LTD. (JP) | 2003-10-14 | — | — | US | disclosed |
| EP-1219598-A1 | PHENOLIC COMPOUNDS AND RECORDING MATERIALS CONTAINING THE SAME | NIPPON SODA CO., LTD. (JP) | 2002-07-03 | — | — | EP | disclosed |
| EP-0860429-B1 | DIPHENYL SULFONE CROSSLINKING TYPE COMPOUNDS AND RECORDING MATERIALS USING THEM | NIPPON SODA CO (JP) | 2001-12-12 | — | — | EP | disclosed |
| EP-1158322-A1 | LIGHT TRANSMITTING PLATE | NIPPON ZEON CO., LTD. (JP) | 2001-11-28 | — | — | EP | disclosed |
| EP-1055863-A1 | LIGHTING EQUIPMENT | NIPPON ZEON CO., LTD. (JP) | 2000-11-29 | — | — | EP | disclosed |
| US-6037308-A | HIGH RECORDED IMAGE PRESERVABILITY | NIPPON SODA CO., LTD. (JP) | 2000-03-14 | — | — | US | disclosed |
| US-5739078-A | FOR THERMAL RECORDING PAPERS AND PRESSURE SENSITIVE COPYING PAPERS | NIPPON SODA CO., LTD. (JP) | 1998-04-14 | — | — | US | disclosed |
| EP-0735105-A1 | NOVEL FLUORAN COMPOUND, INTERMEDIATE, AND CHROMOGENIC RECORDING MATERIAL | NIPPON SODA CO., LTD. (JP) | 1996-10-02 | — | — | EP | disclosed |