SCHEMBL343348

SCHEMBL343348

CC(C)(C)OC(=O)N(CCCCCCCN)C(=O)OC(C)(C)C

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC6 Q9UBN7 2/20 0.40
HDAC1 Q13547 1/20 0.40
HDAC2 Q92769 1/20 0.40
CA14 Q9ULX7 1/20 0.40
CHRM2 P08172 1/20 0.39
PAOX Q6QHF9 3/20 0.36
L3MBTL1 Q9Y468 4/20 0.36
ACHE P22303 1/20 0.34
CPB2 Q96IY4 3/20 0.33
MEN1 O00255 1/20 0.33
ALDH1A1 P00352 1/20 0.33
PLG P00747 1/20 0.33
LMNA P02545 1/20 0.33
THRB P10828 1/20 0.33
ALOX15 P16050 1/20 0.33
SLC6A2 P23975 1/20 0.33
RECQL P46063 1/20 0.33
SLC6A3 Q01959 1/20 0.33
KMT2A Q03164 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL136317 1.00 HDAC6 (0.40) HDAC6HDAC1HDAC2CA14CHRM2
SCHEMBL3795164 1.00 HDAC6 (0.40) HDAC6HDAC1HDAC2CA14CHRM2
SCHEMBL865291 1.00 HDAC6 (0.40) HDAC6HDAC1HDAC2CA14CHRM2
SCHEMBL1906455 1.00 HDAC6 (0.40) HDAC6HDAC1HDAC2CA14CHRM2
SCHEMBL21784320 0.98 CA14 (0.41) HDAC6HDAC1HDAC2CA14CHRM2
SCHEMBL137000 0.90 HDAC6 (0.46) HDAC6HDAC1HDAC2CA14L3MBTL1
SCHEMBL8321919 0.89 CA14 (0.38) HDAC6HDAC1HDAC2CA14CHRM2
SCHEMBL8891211 0.89 CA14 (0.41) HDAC6CA14PAOXMEN1LMNA
SCHEMBL7947788 0.85 CA14 (0.54) HDAC6HDAC1HDAC2CA14CHRM2
SCHEMBL7202844 0.85 CA14 (0.54) HDAC6HDAC1HDAC2CA14CHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10272426-B2 Method of producing microfluidic device, microfluidic device, and photosensitive resin composition JSR CORPORATION (JP) 2019-04-30 US disclosed
EP-3085661-B1 METHOD OF PRODUCING MICROFLUIDIC DEVICE JSR CORP (JP) 2017-12-27 EP disclosed
US-20160310944-A1 METHOD OF PRODUCING MICROFLUIDIC DEVICE, MICROFLUIDIC DEVICE, AND PHOTOSENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-10-27 US disclosed
EP-3085661-A1 METHOD OF PRODUCING MICROFLUIDIC DEVICE, MICROFLUIDIC DEVICE, AND PHOTOSENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2016-10-26 EP disclosed
US-8846290-B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2014-09-30 US disclosed
US-20120015302-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-19 US disclosed