⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15888090 | 0.93 | — | — | |
| SCHEMBL15888088 | 0.93 | — | — | |
| SCHEMBL8946429 | 0.90 | CES1 (0.32) | — | |
| SCHEMBL10018605 | 0.90 | — | — | |
| SCHEMBL13113242 | 0.90 | — | — | |
| SCHEMBL12918952 | 0.88 | — | — | |
| SCHEMBL14995949 | 0.88 | CES1 (0.31) | — | |
| SCHEMBL12918944 | 0.88 | — | — | |
| SCHEMBL13038276 | 0.86 | — | — | |
| SCHEMBL25792933 | 0.86 | CES1 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9134617-B2 | Solvent developable negative resist composition, resist pattern formation method, and method for forming pattern of layer including block copolymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-15 | — | — | US | disclosed |
| US-20140302267-A1 | ABHESIVE COATINGS | VIRGINIA COMMONWEALTH UNIVERSITY (US) | 2014-10-09 | — | — | US | disclosed |
| US-20140113236-A1 | SOLVENT DEVELOPABLE NEGATIVE RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND METHOD FOR FORMING PATTERN OF LAYER INCLUDING BLOCK COPOLYMER | RIKEN (JP) | 2014-04-24 | — | — | US | disclosed |
| US-8353582-B2 | Ultraviolet curable inkjet recording ink and color image forming apparatus | RICOH COMPANY, LTD. (JP) | 2013-01-15 | — | — | US | disclosed |
| US-8241833-B2 | Positive resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2012-08-14 | — | — | US | disclosed |
| US-20120094235-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-04-19 | — | — | US | disclosed |
| US-20120039971-A1 | Solid Powder Cosmetic And Method For Producing The Same | SHISEIDO COMPANY, LTD. (JP) | 2012-02-16 | — | — | US | disclosed |
| US-20120034281-A1 | Solid Powder Cosmetic And Method For Producing The Same | SHISEIDO COMPANY, LTD. (JP) | 2012-02-09 | — | — | US | disclosed |
| US-8092978-B2 | Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-01-10 | — | — | US | disclosed |
| US-8084187-B2 | Resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2011-12-27 | — | — | US | disclosed |
| US-20090253070-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-10-08 | — | — | US | disclosed |
| US-20090246685-A1 | POSITIVE RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY OR EUV AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-10-01 | — | — | US | disclosed |
| US-20090208859-A1 | ANTICURL BACKSIDE COATING (ACBC) PHOTOCONDUCTORS | XEROX CORPORATION (US) | 2009-08-20 | — | — | US | disclosed |
| US-20090208857-A1 | OVERCOAT CONTAINING FLUORINATED POLY(OXETANE) PHOTOCONDUCTORS | XEROX CORPORATION (US) | 2009-08-20 | — | — | US | disclosed |
| US-20090087789-A1 | RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-7498116-B2 | Resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2009-03-03 | — | — | US | disclosed |
| US-20080274421-A1 | PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-11-06 | — | — | US | disclosed |
| US-20080241750-A1 | RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080050675-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-02-28 | — | — | US | disclosed |
| US-20070072118-A1 | Positive photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-29 | — | — | US | disclosed |