SCHEMBL8946429

SCHEMBL8946429

CC(CO)(COCCOCC(C)(CO)COCC(F)(F)C(F)(F)F)COCC(F)(F)C(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CES1 P23141 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14995949 0.98 CES1 (0.31) CES1
SCHEMBL16153820 0.93
SCHEMBL25792933 0.92 CES1 (0.37) CES1
SCHEMBL15888088 0.92
SCHEMBL15888090 0.92
SCHEMBL25774461 0.91 CES1 (0.36) CES1
SCHEMBL3433964 0.90
SCHEMBL10018605 0.88
SCHEMBL10013969 0.88 CES1 (0.34) CES1
SCHEMBL12918944 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11697709-B2 Poly(arylene ether) compositions and articles incorporating the same THE BOEING COMPANY (US) 2023-07-11 US disclosed
US-8216775-B2 Anti-reflection film forming material, and method for forming resist pattern using the same TOKYO OHKA KOGYO CO., LTD. (JP) 2012-07-10 US disclosed
US-8188159-B2 Environmentally friendly additives for inkjet inks HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2012-05-29 US disclosed
US-20090253077-A1 Anti-reflection film forming material, and method for forming resist pattern using the same TOKYO OHKA KOGYO CO., LTD. 2009-10-08 US disclosed