SCHEMBL344525

SCHEMBL344525

C=CC(=O)OCCNC(C)C

nearest known ligand 0.52

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 8/20 0.52
ALDH1A1 P00352 4/20 0.50
TP53 P04637 3/20 0.50
HIF1A Q16665 3/20 0.50
CYP3A4 P08684 2/20 0.50
HPGD P15428 1/20 0.50
HSD17B10 Q99714 1/20 0.50
THRB P10828 2/20 0.42
MAPK1 P28482 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
KDM4E B2RXH2 4/20 0.34
CYP1A2 P05177 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33
POLB P06746 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL345340 0.89 TSHR (0.57) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL11593258 0.87 TSHR (0.60) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL12831657 0.86 TSHR (0.63) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL3282484 0.84 TSHR (0.50) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL16295877 0.82 TSHR (0.52) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL27809444 0.81 TSHR (0.52) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL11737400 0.81 TSHR (0.52) TSHRALDH1A1TP53HIF1ACYP3A4
Hydrochloric Acid SCHEMBL3517684 0.80 TSHR (0.50) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL9637242 0.80 TSHR (0.55) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL25294131 0.79 TSHR (0.48) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250388717-A1 POLYUREA ACRYLATE OLIGOMER CONTAINING PROTECTED GROUPS AND PREPARATION METHOD AND APPLICATION THEREOF UNIV ZHEJIANG (CN) 2025-12-25 US claimed
CN-115151586-B Single part moisture curable resin for additive manufacturing 卡本有限公司 2024-09-20 CN claimed
CN-118667121-A Polyurea acrylate oligomer containing protected group, and preparation method and application thereof 浙江大学 2024-09-20 CN claimed
CN-117736530-A High-heat-conductivity boron nitride/PMMA composite material and preparation method thereof 郑州中科新兴产业技术研究院 2024-03-22 CN claimed
CN-115785328-B Preparation method of partially crosslinked PMMA and composite material thereof 郑州中科新兴产业技术研究院 2024-03-22 CN claimed
CN-115785328-A Partially crosslinked PMMA and preparation method of composite material thereof 郑州中科新兴产业技术研究院 2023-03-14 CN claimed
CN-115151586-A One part moisture curable resin for additive manufacturing 卡本有限公司 2022-10-04 CN claimed
CN-115010899-A Preparation method of polyurea acrylate oligomer, polyurea acrylate oligomer and application method of polyurea acrylate oligomer 浙江大学 2022-09-06 CN claimed
US-20060181587-A1 Ink set and media for ink-jet printing HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2006-08-17 US claimed
US-4129610-A VINYL COPOLYMER, EPOXY RESIN HITACHI CHEMICAL CO., LTD. 1978-12-12 US claimed
US-20250388717-A1 POLYUREA ACRYLATE OLIGOMER CONTAINING PROTECTED GROUPS AND PREPARATION METHOD AND APPLICATION THEREOF UNIV ZHEJIANG (CN) 2025-12-25 US disclosed
CN-118667121-B Polyurea acrylate oligomer containing protected group, and preparation method and application thereof 浙江大学 2025-03-21 CN disclosed
CN-115151586-B Single part moisture curable resin for additive manufacturing 卡本有限公司 2024-09-20 CN disclosed
CN-118667121-A Polyurea acrylate oligomer containing protected group, and preparation method and application thereof 浙江大学 2024-09-20 CN disclosed
CN-115785328-B Preparation method of partially crosslinked PMMA and composite material thereof 郑州中科新兴产业技术研究院 2024-03-22 CN disclosed
US-5064879-A METHOD FOR SORBING METALLIC IONS USING ETHYLENE-N,N-DIALKYL AMINOALKYL ACRYLATES POLYMERS SUMITOMO CHEMICAL CO., LTD. (JP) 1991-11-12 US disclosed
EP-0340975-A1 Ethylene copolymers as sorbers of metallic ions from solutions SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1989-11-08 EP disclosed
US-4859710-A Lead accumulator SUMITOMO CHEMICAL CO., LIMITED (JP) 1989-08-22 US disclosed
US-4129610-A VINYL COPOLYMER, EPOXY RESIN HITACHI CHEMICAL CO., LTD. 1978-12-12 US disclosed
US-3976824-A Treating agent useful for fibrous materials and preparation thereof ARAKAWA RINSAN KAGAKU KOGYO KABUSHIKI KAISHA (JA) 1976-08-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250388717-A1 POLYUREA ACRYLATE OLIGOMER CONTAINING PROTECTED GROUPS AND PREPARATION METHOD AND APPLICATION THEREOF DCTD, UMPS, IMPDH1 TSHR 1042/4885ALDH1A1 498/4885TP53 3016/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.