SCHEMBL3445935

SCHEMBL3445935

FCCCCCCI

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20957525 1.00
SCHEMBL13665546 1.00
SCHEMBL8921008 1.00
SCHEMBL1010560 1.00
SCHEMBL13665402 1.00
SCHEMBL3444560 1.00
SCHEMBL20957516 1.00
SCHEMBL20957519 1.00
SCHEMBL3444274 0.96
SCHEMBL296261 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108137621-B Novel method for preparing aminosilane compounds 株式会社LG化学 2021-07-06 CN claimed
US-10556918-B2 Method for preparing aminosilane-based compound LG CHEM, LTD. (KR) 2020-02-11 US claimed
EP-3330273-B1 NOVEL METHOD FOR PREPARING AMINOSILANE-BASED COMPOUND LG CHEMICAL LTD (KR) 2019-06-19 EP claimed
US-20180282353-A1 NOVEL METHOD FOR PREPARING AMINOSILANE-BASED COMPOUND LG CHEM, LTD. (KR) 2018-10-04 US claimed
EP-3330273-A2 NOVEL METHOD FOR PREPARING AMINOSILANE-BASED COMPOUND LG Chem, Ltd. (KR) 2018-06-06 EP claimed
WO-2023153482-A1 MATERIAL FOR METAL PATTERNING, HETEROCYCLIC COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENT DEVICE, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2023-08-17 WO disclosed
US-11079675-B2 Compound, photocurable composition, cured product of same, printing ink, and printed matter curing the printing ink DIC CORPORATION (JP) 2021-08-03 US disclosed
CN-108137621-B Novel method for preparing aminosilane compounds 株式会社LG化学 2021-07-06 CN disclosed
US-10556918-B2 Method for preparing aminosilane-based compound LG CHEM, LTD. (KR) 2020-02-11 US disclosed
EP-3330273-B1 NOVEL METHOD FOR PREPARING AMINOSILANE-BASED COMPOUND LG CHEMICAL LTD (KR) 2019-06-19 EP disclosed
US-20190137872-A1 NOVEL COMPOUND, PHOTOCURABLE COMPOSITION, CURED PRODUCT OF SAME, PRINTING INK, AND PRINTED MATTER SURING THE PRINTING INK DIC CORPORATION (JP) 2019-05-09 US disclosed
US-20180282353-A1 NOVEL METHOD FOR PREPARING AMINOSILANE-BASED COMPOUND LG CHEM, LTD. (KR) 2018-10-04 US disclosed
US-20070213490-A1 Aminoalkoxystyrene, process for preparation thereof, polymer thereof, process for producing the polymer and use thereof TOSOH CORPORATION 2007-09-13 US disclosed
EP-1829857-A1 Aminoalkoxystyrene, process for preparation thereof, polymer thereof, process for producing the polymer and use thereof Tosoh Corporation (JP) 2007-09-05 EP disclosed
CN-1965067-A Methods and systems for making, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film-forming foams, and foam stabilizers PCBU SERVICES INC (US) 2007-05-16 CN disclosed
CN-1960958-A Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foams stabilizers GREAT LAKES CHEMICAL CORP (US) 2007-05-09 CN disclosed
CN-1957078-A Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foams stabilizers PCBU SERVICES INC (US) 2007-05-02 CN disclosed
CN-1938414-A Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film-forming foams, and foam stabilizers PCBU SERVICES INC (US) 2007-03-28 CN disclosed
CN-1938343-A Fluorine-containing monomer, fluorine-containing polymer, and surface treatment agent DAIKIN IND LTD (JP) 2007-03-28 CN disclosed
WO-1997002226-A1 PROCESS FOR THE PREPARATION OF FLUOROOLEFINS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1997-01-23 WO disclosed