SCHEMBL3447191

SCHEMBL3447191

C=C(C)C(=O)OCC(C=Cc1ccccc1)OC(=O)C(=C)C

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 5/20 0.43
KMT2A Q03164 5/20 0.43
TSHR P16473 1/20 0.42
CYP3A4 P08684 1/20 0.39
GLA P06280 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
CYP1A2 P05177 1/20 0.39
CNR2 P34972 1/20 0.37
LMNA P02545 3/20 0.36
RAB9A P51151 2/20 0.36
L3MBTL1 Q9Y468 2/20 0.36
NPC1 O15118 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
KDM4E B2RXH2 2/20 0.36
MAPT P10636 2/20 0.36
ALDH1A1 P00352 1/20 0.36
ADORA3 P0DMS8 1/20 0.36
HPGD P15428 1/20 0.36
XBP1 P17861 1/20 0.36
GAA P10253 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2246299 0.89 MEN1 (0.39) MEN1KMT2ATSHRCYP3A4GLA
SCHEMBL28678088 0.88 MEN1 (0.40) MEN1KMT2ATSHRCYP3A4GLA
SCHEMBL2120464 0.88 TSHR (0.39) MEN1KMT2ATSHRTDP1LMNA
SCHEMBL7922839 0.86 TDP1 (0.41) MEN1KMT2ATSHRCYP3A4GLA
SCHEMBL27939088 0.86 MEN1 (0.39) MEN1KMT2ACYP3A4GLATDP1
SCHEMBL11766109 0.85 MEN1 (0.45) MEN1KMT2ACYP3A4GLATDP1
SCHEMBL11766103 0.85 MEN1 (0.45) MEN1KMT2ACYP3A4GLATDP1
SCHEMBL3007713 0.84 TSHR (0.44) MEN1KMT2ATSHRCYP3A4GLA
SCHEMBL27939045 0.83 MEN1 (0.40) MEN1KMT2ACYP3A4GLATDP1
SCHEMBL448676 0.81 TSHR (0.41) MEN1KMT2ATSHRCYP3A4GLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110923130-B Microbial sensor and preparation method and application thereof 嘉兴学院 2023-08-18 CN claimed
CN-110923130-A Microbial sensor and preparation method and application thereof 嘉兴学院 2020-03-27 CN claimed
CN-109957071-A Magnetic particle and its manufacturing method 财团法人工业技术研究院 2019-07-02 CN claimed
CN-110923130-B Microbial sensor and preparation method and application thereof 嘉兴学院 2023-08-18 CN disclosed
CN-111363512-A 3D ink-jet full-lamination optical adhesive 嘉兴市海睿新材料有限公司 2020-07-03 CN disclosed
CN-110923130-A Microbial sensor and preparation method and application thereof 嘉兴学院 2020-03-27 CN disclosed
US-7816172-B2 Organic thin-film transistor and fabrication method thereof and organic thin-film device KANTO DENKA KOGYO CO., LTD. (JP) 2010-10-19 US disclosed
US-20100144919-A1 Reactive polymeric nanoparticles (RPNPS) for restoration materials in dentistry BORBELY JANOS 2010-06-10 US disclosed
US-20070194302-A1 Organic thin-film transistor and fabrication method thereof and organic thin-film device KANTO DENKA KOGYO CO., LTD. (JP) 2007-08-23 US disclosed
US-20060088470-A1 Inorganic beads with hierarchical pore structures GE HEALTHCARE BIO-SCIENCES AB (SE) 2006-04-27 US disclosed
EP-1594817-A1 INORGANIC BEADS WITH HIERARCHICAL PORE STRUCTURES Amersham Biosciences AB (SE) 2005-11-16 EP disclosed
WO-2003064478-A2 SURFACE GRAFT MODIFIED RESINS AND FORMATION THEREOF PHENOMENEX, INC. (US) 2003-08-07 WO disclosed
EP-0925776-A2 Polymer with binding capacity for organoleptic substances GIVAUDAN-ROURE (INTERNATIONAL) S.A. (CH) 1999-06-30 EP disclosed
US-5906885-A Magnetic recording medium TDK CORPORATION (JP) 1999-05-25 US disclosed
EP-0577838-B1 POLYESTER COMPOSITION AND BIAXIALLY ORIENTED POLYESTER FILM MADE THEREFROM TORAY INDUSTRIES (JP) 1997-07-16 EP disclosed
EP-0735525-A2 Magnetic recording medium TDK Corporation (JP) 1996-10-02 EP disclosed
US-5523327-A NONTOXIC; POLLUTION CONTROL; CORROSION RESISTANCE; ALIPHATIC AND CYCLOALIPHATIC SWELLING AGENTS; AMINATION; NONBREAKING SYBRON CHEMICAL HOLDINGS INC. (US) 1996-06-04 US disclosed
US-5470637-A Zirconium oxide particles with monoclinic or tetragonal crystal structure TORAY INDUSTRIES, INC. (JP) 1995-11-28 US disclosed
US-5389288-A Using spacer particle; uniform molecular orientation KAO CORPORATION (JP) 1995-02-14 US disclosed
EP-0577838-A1 POLYESTER COMPOSITION AND BIAXIALLY ORIENTED POLYESTER FILM MADE THEREFROM TORAY INDUSTRIES, INC. (JP) 1994-01-12 EP disclosed