SCHEMBL345353

SCHEMBL345353

C=CC(=O)N(CCCC)CCCC

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ZDHHC20 Q5W0Z9 4/20 0.61
ZDHHC2 Q9UIJ5 2/20 0.61
CA12 O43570 3/20 0.50
CA1 P00915 3/20 0.50
CA9 Q16790 3/20 0.50
MMP1 P03956 1/20 0.47
MMP2 P08253 1/20 0.47
MMP3 P08254 1/20 0.47
MMP8 P22894 1/20 0.47
TSHR P16473 2/20 0.42
HPGD P15428 1/20 0.42
ALDH1A1 P00352 3/20 0.40
ALDH2 P05091 1/20 0.40
THRA P10827 5/20 0.39
THRB P10828 5/20 0.39
CA2 P00918 1/20 0.38
FAAH O00519 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
MEN1 O00255 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23421169 0.98 ZDHHC20 (0.64) ZDHHC20ZDHHC2CA12CA1CA9
SCHEMBL23421038 0.98 ZDHHC20 (0.59) ZDHHC20ZDHHC2CA12CA1CA9
SCHEMBL23421424 0.98 ZDHHC20 (0.59) ZDHHC20ZDHHC2CA12CA1CA9
SCHEMBL15233342 0.96 ZDHHC20 (0.67) ZDHHC20ZDHHC2CA12CA1CA9
SCHEMBL4577787 0.96 ZDHHC20 (0.57) ZDHHC20ZDHHC2CA12CA1CA9
SCHEMBL23420808 0.96 ZDHHC20 (0.67) ZDHHC20ZDHHC2CA12CA1CA9
SCHEMBL23420075 0.96 ZDHHC20 (0.67) ZDHHC20ZDHHC2CA12CA1CA9
SCHEMBL3466975 0.94 ZDHHC20 (0.70) ZDHHC20ZDHHC2CA12CA1CA9
SCHEMBL3467199 0.94 ZDHHC20 (0.70) ZDHHC20ZDHHC2CA12CA1CA9
SCHEMBL6116639 0.94 ZDHHC20 (0.70) ZDHHC20ZDHHC2CA12CA1CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2154 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250320316-A1 FREE RADICAL SOLUTION POLYMERIZATION METHOD, POLYMER AND USE CHINA PETROLEUM & CHEM CORP (CN) 2025-10-16 US claimed
CN-119899839-A CrRNA-spacer complex, CRISPR-Cas13 system, CANTX sensor and application thereof 武汉大学 2025-04-29 CN claimed
EP-4527862-A1 FREE RADICAL SOLUTION POLYMERIZATION METHOD, POLYMER, AND USE China Petroleum & Chemical Corporation (CN) 2025-03-26 EP claimed
CN-115135307-B Cell delivery vehicle 株式会社ITO 2024-11-22 CN claimed
CN-118063704-A Graft copolymer, process for producing the same, rubber composition, use and tire 中国石油化工股份有限公司 2024-05-24 CN claimed
CN-117986463-A Copolymer, preparation method and application thereof, and copolymer containing polar side chains, and preparation method and application thereof 中国石油化工股份有限公司 2024-05-07 CN claimed
CN-117630273-A Rapid determination method for sulfonation degree of ultra-high temperature hydrolysis-resistant polymer 中国石油化工股份有限公司 2024-03-01 CN claimed
CN-115322620-B Emulsified writing ink and preparation method thereof 苏州雄鹰笔墨新材料有限公司 2023-12-22 CN claimed
WO-2023222004-A1 FREE RADICAL SOLUTION POLYMERIZATION METHOD, POLYMER, AND USE 中国石油化工股份有限公司 2023-11-23 WO claimed
CN-117098815-A Rubberized asphalt composition having acrylic copolymer 巴斯夫欧洲公司 2023-11-21 CN claimed
US-5116912-A Protective or decorative surface treatment of metal or plastic articles HENKEL CORPORATION (US) 1992-05-26 US claimed
EP-0092794-B2 LIGHT-SENSITIVE PRINTING PLATE FUJI PHOTO FILM CO., LTD. (JP) 1992-04-08 EP claimed
WO-1991018861-A1 2-(HYDROXYMETHYL) ACRYLATE DERIVATIVES AND PROCESS FOR THEIR PREPARATION COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) 1991-12-12 WO claimed
US-5068299-A Monomers for polymers containing vinylphenols for protective coatings or decoration HENKEL CORPORATION (US) 1991-11-26 US claimed
WO-1991009904-A2 RINSE AID FOR PLASTIC AND PAINTED SURFACES HENKEL CORPORATION (US) 1991-07-11 WO claimed
EP-0319017-A2 Treatment and after-treatment of metal with carbohydrate-modified polyphenol compounds HENKEL CORPORATION (a Delaware corp.) (US) 1989-06-07 EP claimed
EP-0319016-A2 Treatment and after-treatment of metal with polyphenol compounds HENKEL CORPORATION (a Delaware corp.) (US) 1989-06-07 EP claimed
EP-0092794-B1 LIGHT-SENSITIVE PRINTING PLATE FUJI PHOTO FILM CO., LTD. (JP) 1987-07-15 EP claimed
US-4557994-A MICROPATTERN OF TERPOLYMER RESISTANT TO RUBBING AND PRESSURE FUJI PHOTO FILM CO., LTD. (JP) 1985-12-10 US claimed
EP-0092794-A2 Light-sensitive printing plate FUJI PHOTO FILM CO., LTD. (JP) 1983-11-02 EP claimed