Bromide

Bromide

SCHEMBL3456702

Br.Br.[B+3].[H+]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4

The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL23326424 0.82
Bromide SCHEMBL27497036 0.82
SCHEMBL1929773 0.82
Bromide SCHEMBL2144385 0.82
Bromide SCHEMBL29077788 0.82
Fluoride SCHEMBL2814762 0.67
Fluoride Ion SCHEMBL6756047 0.67
Bromide SCHEMBL22129188 0.67
Bromide SCHEMBL21618410 0.67
Bromide SCHEMBL6946786 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1912720-B1 PROCESS FOR REMOVING CARBON AND/OR PHOSPHORUS IMPURITIES FROM A SILICON PRODUCTION FACILITY LORD LTD LP (US) 2014-05-14 EP disclosed
US-7790129-B2 Set of processes for removing impurities from a silcon production facility LORD LTD., LP (US) 2010-09-07 US disclosed
EP-1912720-A2 A SET OF PROCESSES FOR REMOVING IMPURITIES FROM A SILICON PRODUCTION FACILITY Lord, Stephen M. (US) 2008-04-23 EP disclosed
US-20070098612-A1 Set of processes for removing impurities from a silcon production facility XSI INTERNATIONAL CORPORATION, A BRITISH VIRGIN ISLANDS COMPANY (VG) 2007-05-03 US disclosed
WO-2007015721-A2 A SET OF PROCESSES FOR REMOVING IMPURITIES FROM A SILICON PRODUCTION FACILITY LORD STEPHEN M (US) 2007-02-08 WO disclosed