SCHEMBL346231

SCHEMBL346231

O=C(O)c1ccc(-c2ccc(C(c3ccc(-c4ccc(C(=O)O)c(C(=O)O)c4)cc3)(C(F)(F)F)C(F)(F)F)cc2)cc1C(=O)O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RXRB P28702 3/20 0.46
RXRA P19793 2/20 0.46
KDM4E B2RXH2 3/20 0.45
ALDH1A1 P00352 2/20 0.45
HPGD P15428 2/20 0.45
HSD17B10 Q99714 2/20 0.45
ACMSD Q8TDX5 3/20 0.43
HNF4A P41235 2/20 0.43
MCL1 Q07820 2/20 0.43
DHFR P00374 1/20 0.43
ACLY P53396 3/20 0.43
GFER P55789 1/20 0.43
KMT2A Q03164 1/20 0.43
RXFP1 Q9HBX9 1/20 0.43
KDM1A O60341 3/20 0.43
ESR1 P03372 1/20 0.42
ESR2 Q92731 1/20 0.42
RXRG P48443 1/20 0.41
AKR1C2 P52895 1/20 0.41
AKR1C1 Q04828 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29459104 1.00 RXRB (0.46) RXRBRXRAKDM4EALDH1A1HPGD
SCHEMBL29401067 0.85 HSD17B10 (0.50) RXRBRXRAKDM4EALDH1A1HPGD
SCHEMBL1770132 0.85 HSD17B10 (0.50) RXRBRXRAKDM4EALDH1A1HPGD
SCHEMBL9492931 0.85 HSD17B10 (0.50) RXRBRXRAKDM4EALDH1A1HPGD
SCHEMBL109108 0.85 HSD17B10 (0.50) RXRBRXRAKDM4EALDH1A1HPGD
SCHEMBL29441324 0.85 HSD17B10 (0.50) RXRBRXRAKDM4EALDH1A1HPGD
SCHEMBL8999910 0.85 RXRB (0.47) RXRBRXRAACMSDHNF4AMCL1
SCHEMBL5549572 0.84 HSD17B10 (0.49) RXRBRXRAKDM4EALDH1A1HPGD
Hydrochloric Acid SCHEMBL8507928 0.84 HSD17B10 (0.49) RXRBRXRAKDM4EALDH1A1HPGD
Water SCHEMBL4580188 0.84 HSD17B10 (0.49) RXRBRXRAKDM4EALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106700965-B Anisotropic conductive adhesive, method for producing same, circuit connection structure, and application 日立化成株式会社 2020-03-06 CN claimed
CN-102838947-B Modifier for adhesive, method for producing same, adhesive, and circuit connection structure 日立化成株式会社 2019-01-01 CN claimed
CN-102127375-B The manufacture method of the attachment structure of circuit connection material, the attachment structure of circuit block and circuit block 日立化成株式会社 2016-09-28 CN claimed
US-20240381529-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND APPLICATION FOR PREPREG RESONAC CORPORATION (JP) 2024-11-14 US disclosed
US-11901211-B2 Semiconductor-processing tape FURUKAWA ELECTRIC CO., LTD. (JP) 2024-02-13 US disclosed
CN-114364761-B Adhesive tape for semiconductor processing 古河电气工业株式会社 2024-02-02 CN disclosed
US-20230331946-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE RESONAC CORPORATION (JP) 2023-10-19 US disclosed
CN-110036459-B Semiconductor processing tape 古河电气工业株式会社 2023-07-14 CN disclosed
CN-112351859-B Adhesive tape for glass processing 古河电气工业株式会社 2023-04-11 CN disclosed
WO-2023042305-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND APPLICATION FOR PREPREG 株式会社レゾナック 2023-03-23 WO disclosed
CN-112368107-B Adhesive tape for glass processing 古河电气工业株式会社 2022-10-25 CN disclosed
US-20100178501-A1 ADHESIVE COMPOSITION, FILM-LIKE ADHESIVE, ADHESIVE SHEET, AND SEMICONDUCTOR DEVICE MADE WITH THE SAME HITACHI CHEMICAL CO., LTD. (JP) 2010-07-15 US disclosed
US-20100143673-A1 PHOTOSENSITIVE ADHESIVE COMPOSITION, FILM-LIKE ADHESIVE, ADHESIVE SHEET, ADHESIVE PATTERN, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD HITACHI CHEMICAL COMPANY, LTD. (JP) 2010-06-10 US disclosed
EP-2151715-A1 PHOTOSENSITIVE ADHESIVE COMPOSITION, FILM-LIKE ADHESIVE, ADHESIVE SHEET, METHOD FOR FORMING ADHESIVE PATTERN, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE Hitachi Chemical Company, Ltd. (JP) 2010-02-10 EP disclosed
EP-2135910-A1 PHOTOSENSITIVE ADHESIVE COMPOSITION, FILM-LIKE ADHESIVE, ADHESIVE SHEET, ADHESIVE PATTERN, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD Hitachi Chemical Company, Ltd. (JP) 2009-12-23 EP disclosed
EP-2055757-A1 CIRCUIT CONNECTING MATERIAL, CONNECTION STRUCTURE OF CIRCUIT MEMBER, AND METHOD FOR MANUFACTURING CONNECTION STRUCTURE OF CIRCUIT MEMBER Hitachi Chemical Company, Ltd. (JP) 2009-05-06 EP disclosed
US-20080176167-A1 Photopolymerization; polyimides; photomasks; wafers; sheets; films RESONAC CORPORATION (JP) 2008-07-24 US disclosed
EP-1901123-A1 PHOTOSENSITIVE ADHESIVE COMPOSITION, AND OBTAINED USING THE SAME, ADHESIVE FILM, ADHESIVE SHEET, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND ELECTRONIC PART HITACHI CHEMICAL COMPANY, LTD. (JP) 2008-03-19 EP disclosed
US-20070098995-A1 Adhesive film and process for preparing the same as well as adhesive sheet and semiconductor device HITACHI CHEMICAL CO., LTD. (JP) 2007-05-03 US disclosed
US-5578697-A DIELECTRIC POLYMERS FOR ELECTRONICS KABUSHIKI KAISHA TOSHIBA (JP) 1996-11-26 US disclosed